Hicham Marhfour
at SCREEN SPE France S.a.r.l.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11612, 116120M (2021) https://doi.org/10.1117/12.2584515
KEYWORDS: Lithography, Extreme ultraviolet, Photoresist developing, Thin film coatings, Line width roughness, Photoresist materials, Extreme ultraviolet lithography

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top