Hidde Keizers
at ASML Netherlands B.V.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 1295306 (2024) https://doi.org/10.1117/12.3009878
KEYWORDS: Wavefronts, Extreme ultraviolet, Extreme ultraviolet lithography, Light sources and illumination, Stochastic processes, Diffraction, Optical lithography, Source mask optimization, Projection systems

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top