CONFERENCE PROCEEDINGS
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Dr. John R. Carruthers
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 14 June 1996 Paper
Patterning ULSI Circuits
Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241809
KEYWORDS: Photomasks, Optical lithography, Photoresist processing, Critical dimension metrology, Reflectivity, Image processing, Optical alignment, Excimer lasers, Diffraction, Semiconducting wafers
Proceedings Article | 7 June 1996 Paper
Patterning ULSI circuits
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240903
KEYWORDS: Photomasks, Optical lithography, Photoresist processing, Critical dimension metrology, Reflectivity, Image processing, Optical alignment, Excimer lasers, Diffraction, Semiconducting wafers
Proceedings Article | 27 May 1996 Paper
Patterning ULSI circuits
Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240458
KEYWORDS: Photomasks, Critical dimension metrology, Reflectivity, Overlay metrology, Photoresist processing, Optical alignment, Optical lithography, Excimer lasers, Diffraction, Semiconducting wafers
Proceedings Article | 21 May 1996 Paper
Patterning ULSI circuits
Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240078
KEYWORDS: Photomasks, Optical lithography, Photoresist processing, Critical dimension metrology, Reflectivity, Overlay metrology, Image processing, Optical alignment, Lithography, Excimer lasers
Proceedings Volume Editor (1)
Conference Committee Involvement (1)
Microelectronic Interconnects and Packages: System and Process Integration
5 November 1990 | Boston, MA, United States
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