I devised a method of electron beam lithography for patterning thin-film silicon- nitride membranes with nanoscale metal arrays of known dimensions. Employing SEM image-based metrology and ellipsometry to determine all three spatial dimensions of the metal nanostructures in the array, the calculated mass of each individual one can be used as a standard for elemental X-ray microanalysis. Thereafter, the net X-ray counts from the patterned nanostructures on a thin silicon-nitride substrate and nanoparticle unknowns can be compared directly for a "standards-based" quantitative analysis. The minimum mass detectable by this technique is ~10-15 gm, supporting the determination of the absolute mass of nanoparticles with diameters as small as 20 to 30 nm. I then used a JEOL 6500F SEM equipped with a Bruker Quantax XFlash 4030 silicon drift detector (SDD) to assess the absolute masses of nickel nanoparticles contained in agglomerates of single-walled carbon nanotubes.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.