Dr. Juan P. Bravo-Vasquez Profile

Dr. Juan P. Bravo-Vasquez

at Pureleau

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Author

Publications (4)

Proceedings Article | 4 May 2005 Paper

Inorganic polymer resists for EUVL

Juan Pablo Bravo-Vasquez, Young-Je Kwark, Christopher Ober, Heidi Cao, Hai Deng

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600172

KEYWORDS: Silicon, Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Absorbance, Lithography, Electron beam lithography, Chlorine, Humidity, Nitrogen

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Proceedings Article | 4 May 2005 Paper

Materials for future lithography

Seung Wook Chang, Da Yang, Junyan Dai, Nelson Felix, Daniel Bratton, Kousuke Tsuchiya, Young-Je Kwark, Juan-Pablo Bravo-Vasquez, Christopher Ober, Heidi Cao, Hai Deng

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.607235

KEYWORDS: Glasses, Line edge roughness, Extreme ultraviolet lithography, Electron beam lithography, Lithography, Extreme ultraviolet, Polymers, Silicon, Chemical elements, Molecules

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Proceedings Article | 14 May 2004 Paper

Silicon backbone polymers as EUV resists

Juan Pablo Bravo-Vasquez, Young-Je Kwark, Christopher Ober, Heidi Cao, Hai Deng, Robert Meagley

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536438

KEYWORDS: Silicon, Polymers, Chlorine, Extreme ultraviolet, Polymerization, Lithography, Nitrogen, Absorbance, Transparency, Extreme ultraviolet lithography

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Proceedings Article | 12 June 2003 Paper

Novel silicon-containing polymers as photoresist materials for EUV lithography

Young-Je Kwark, Juan-Pablo Bravo-Vasquez, Christopher Ober, Heidi Cao, Hai Deng, Robert Meagley

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485184

KEYWORDS: Silicon, Polymers, Polymerization, Extreme ultraviolet lithography, Extreme ultraviolet, Ruthenium, Molybdenum, Transparency, Metals, Lithography

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