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Mansoor Abbas
Field Application Engineer at Synopsys Inc
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Publications (1)
Proceedings Article | 25 September 2010 Paper
EUV mask defect mitigation through pattern placement
John Burns, Mansoor Abbas
Proceedings Volume 7823, 782340 (2010) https://doi.org/10.1117/12.865160
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Defect detection, Semiconducting wafers, Roads, Lithography, Optical alignment, Optical lithography
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