Minoo Mirsaeedi
Senior Design Engineer at Univ of Waterloo
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 4 April 2011 Paper
Proceedings Volume 7974, 79740O (2011) https://doi.org/10.1117/12.877601
KEYWORDS: Lithography, Photomasks, Double patterning technology, Manufacturing, Dielectrics, Optical proximity correction, Image quality, Etching, Overlay metrology, Image processing

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