Nabil Azad
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12958, (2024) https://doi.org/10.1117/12.3016092
KEYWORDS: Optical lithography, Extreme ultraviolet, Double patterning technology, Metals, Design and modelling, Ruthenium, Extreme ultraviolet lithography, Copper, Resistors, Resistance

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