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Norman Birnstein
at KLA-Tencor GmbH
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Publications (1)
Proceedings Article | 26 May 2022 Poster + Presentation + Paper
A new development algorithm to optimize scanner alignment sampling for cross-chuck overlay performance optimization
Chieh-Chen Chiu, Feng Tian, Wei Feng, Mingqi Gao, Andy Lan, Chao-Jen Tsou, Shengyuan Zhong, Norman Birnstein, Robin Maximilian Zech, Clemens Utzny, Jin Zhu, Jincheng Pei, Kevin Huang
Proceedings Volume 12053, 1205329 (2022) https://doi.org/10.1117/12.2627283
KEYWORDS: Optical alignment, Optimization (mathematics), Scanners, Semiconducting wafers, Overlay metrology, Data modeling, Performance modeling, Semiconductors
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