Mr. Payne Qi Profile

Payne Qi

at ASML Wuhan

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Publications (1)

Proceedings Article | 20 March 2020 Paper

A novel accurate and robust technique in after-etch overlay metrology of 3D-NAND’s memory holes

Yaobin Feng, Dean Wu, Pandeng Xuan, Pavel Izikson, Payne Qi, Huanian You, Yvon Chai, Jan Jitse Venselaar, Giulio Bottegal, Gonzalo Sanguinetti, Bert Verstraeten, Tjitte Nooitgedagt, Babak Mozooni

Proceedings Volume 11325, 1132522 (2020) https://doi.org/10.1117/12.2553054

KEYWORDS: Optical metrology, Overlay metrology, Semiconducting wafers, Signal processing, Metrology, Machine learning, Image processing, Optical signal processing, Optics manufacturing

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