Mr. Robert Vinje Profile

Robert Vinje

Module Manager at Cypress Semiconductor Inc

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 27 December 2002 Paper

Reticle defect printability: impact on yield and feedback to suppliers

Robert Vinje, Arthur Klaum, David Chmielewski, Matt Lamantia, Dawn Woolery, Dianna Coburn, Colleen Weins

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468087

KEYWORDS: Reticles, Inspection, Semiconducting wafers, Manufacturing, Defect detection, Semiconductors, Photomasks, Defect inspection, Etching, Wafer inspection

Read Abstract +

The semiconductor industry continues to aggressively shrink linewidths and manufacture more closely spaced patterns to improve power and speed performances, as well as increase die per wafer counts. Current development is near 100 nm and high volume manufacturing is commonly near 150 nm. These smaller linewidths and more dense patterns are hampered with new populations of defects that were previously unimportant second or third order effects. As a result, new defects of interest must specifically be investigated, detected, and prevented on the reticles that hold master images of what is being printed. This is often difficult because reticle manufacturing, reticle defect detection, and reticle end-usage (manufacturer) typically spans three corporations. If defects occur on wafers that were not detected with current reticle inspection capabilities, there must be correlation from the printed wafer back to the reticle to assist the reticle supplier in locating the defect and working towards eliminating the problem. In some cases, photo defects may not impact device functionality. As a result closed-loop analyses and actions, which determine whether an event actually causes yield loss, must be developed into the business practices of multiple companies. This paper reports on an inter-company process (ICP) involving Cypress Semiconductor Corporation, Dupont Photomask Incorporated, and KLA-Tencor. The ICP evaluates reticle defects on wafers, their impact on yield, and the transfer of the defect information back to the reticle vendor in an effort to improve overall reticle quality for a 150 nm and beyond semiconductor manufacturing fab.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years