Nanocomposite carbon-palladium thin films were prepared by PVD method on ceramic (Al2O3) substrates by our group at Tele & Research Institute in Warsaw. Resistance of these films changed under the influence of hydrogen at different concentration of this gas. Set-up for measurements of resistance changes due to gas influence was designed and built. The set-up is composed of measurement chamber, gas flow controllers, valves and specially devoted to this experiment computer system with SkSysM program developed by the author.
In this paper, the measurement system and its metrological properties are described. The uncertainty of measurement of the system during experimental procedure of resistance changes measurements for C-Pd films under influence of hydrogen is described. The uncertainty of measurements, illustrated with the experimental errors for dynamic and static conditions of experiment is also discussed.
In this paper, we present the results studies of CuO layers obtained in different thermal condition. The samples were prepared with composed PVD and thermal oxidation processes. Due to PVD process C-Ni layer on Cu, plate was prepared and such layer was annealed in thermal oxidation process at the temperatures 400 and 500 °C. These two kind of sensors showed different electrical responses on hydrogen and ammonia gases what was connected to different topography of the layers. The adsorption desorption mechanism of reacting gases with developed surface of CuO layer influences on the electrical response.
In this paper we present the results of the optical studies of the reflected light intensity changes of carbonpalladium or carbon-palladium-nickel films under the influences of gases: hydrogen, methane and carbon dioxide. Carbon-palladium film (C-Pd films) and two types of carbon-palladium-nickel films (C-Pd-Ni films) respond to a variety of gases 2 % H2/N2; 2 % CH4/N2; 5 % CO2/N2. Different varieties of films can be used to build selective optical sensors for various gases. Studied films were obtained by Physical Vapor Deposition (PVD) method. Film’s structure and morphology were studied with TEM and FTIR, film's topography was investigated with AFM and SEM.
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