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Takaya Matsushita
at Toshiba Corp
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Publications (1)
Proceedings Article | 17 March 2015 Paper
Dry etch challenges for CD shrinkage in memory process
Takaya Matsushita, Takanori Matsumoto, Hidefumi Mukai, Suigen Kyoh, Kohji Hashimoto
Proceedings Volume 9428, 942807 (2015) https://doi.org/10.1117/12.2085628
KEYWORDS: Etching, Silicon, Critical dimension metrology, Silica, Double patterning technology, Optical lithography, Photomasks, Plasma, Scanning electron microscopy, Dry etching
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