Cost-effective scaling of semiconductor devices is enabled by High NA EUV technology, securing a solution for several technology nodes to come. High NA is an evolutionary step for EUV technology with new optics that increase the numerical aperture to 0.55NA. This paper discusses the benefits of High NA technology from a process complexity reduction point of view as well as the positive impact this will bring to the industry in terms of cost of technology reduction. The paper also explains how the learnings from current generation EUV tools are systematically implemented on High NA to achieve the highest possible maturity level at introduction. The High NA technology is positioned to support development work on advanced nodes (both for logic and memory) starting in 2023 and will support HVM from 2025. This paper will show the first results obtained during development and integration phase of various modules of the first High NA system (EXE:5000).
With the introduction of High NA EUV technology the continuation of scaling semiconductor devices in a cost efficient manner will be secured for several technology nodes to come. In this paper we will discuss the benefits of High NA technology from a process complexity reduction point of view as well as the positive impact that this new lithography platform will bring to the industry in terms of cost of technology reduction.
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