Hybrid plasmonic substrates fabricated by a gap-controlled, template-assisted self assembly of plasmonic nanorods (NRs) inside plasmonic nanolines fabricated using large area lithography are presented. This fabrication process can potentially be employed for wafer scale fabrication of plasmonic substrates with sub-5 nm gaps. The electromagnetic hotspots arising due to these sub-5 nm gaps can be employed for sensing using surface enhanced Raman scattering (SERS). The gaps and the overall configurations of the hybrid substrate are dependent on a combination of several parameters such as the nanoline gaps and the size of the NRs assembled. These plasmonic substrates offer high electromagnetic enhancements along with the possibility of tuning the plasmon resonance wavelength in the near-IR region of the spectrum.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.