Dr. Wei Zhou
CTO at MLOptic Corp
SPIE Involvement:
Conference Program Committee | Author | Instructor | Science Fair Judge
Publications (18)

Proceedings Article | 30 September 2024 Presentation + Paper
Proceedings Volume 13133, 1313304 (2024) https://doi.org/10.1117/12.3028548
KEYWORDS: Calibration, Light sources, Color, Spectral response, Error analysis

Proceedings Article | 30 September 2024 Presentation + Paper
Proceedings Volume 13133, 1313308 (2024) https://doi.org/10.1117/12.3028846
KEYWORDS: Imaging systems, Numerical analysis, Optical imaging, Eye, Ranging, Optometry, Metrology, Image processing, Calibration, Tolerancing

Proceedings Article | 13 March 2024 Presentation + Paper
Proceedings Volume 12909, 129090P (2024) https://doi.org/10.1117/12.3018446
KEYWORDS: Wavefronts, Calibration, Adaptive optics, Sensors, Interferometers, Design, Spatial resolution, Optical metrology

Proceedings Article | 12 March 2024 Poster + Paper
Proceedings Volume 12870, 1287009 (2024) https://doi.org/10.1117/12.3021060
KEYWORDS: Sensors, Cameras, Target detection, Laser optics, Optical imaging, Collimation, Design, Beam splitters, Position sensors, Mirror surfaces

Proceedings Article | 11 March 2024 Poster + Paper
Proceedings Volume 12893, 1289319 (2024) https://doi.org/10.1117/12.3012052
KEYWORDS: Sensors, Optical alignment, Data modeling, 3D modeling, Equipment, Virtual reality, Optical metrology, Environmental sensing, Optical fabrication, Optical components

Showing 5 of 18 publications
Conference Committee Involvement (6)
Optical System Alignment, Tolerancing, and Verification XVI
3 August 2025 | San Diego, California, United States
Optical System Alignment, Tolerancing, and Verification XV
18 August 2024 | San Diego, California, United States
Optical System Alignment, Tolerancing, and Verification XIV
21 August 2022 | San Diego, California, United States
Instrumentation, Metrology, and Standards for Nanomanufacturing VIII
20 August 2014 | San Diego, California, United States
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII
28 August 2013 | San Diego, California, United States
Showing 5 of 6 Conference Committees
Course Instructor
SC1310: Optical Metrology for AR/VR/MR
This course explains basic principles and applications of optical metrology for AR/VR/MR. A primary goal of the course is to reveal the logic of optical methodologies as being critical to the design verification and production yield improvement for this revolutionary consumer electronics product. The class will explore current AR/VR development challenges and how cutting-edge optical metrology technologies are used to boost this fast-growing industry. Out of this course the audience will be able to comfortably describe the fundamental demands of optical metrology for this industry and confidently define a solution path for a particular application.
NON-SPIE: Optical Metrology for AR/VR/MR
This course explains basic principles and applications of Optical Metrology for AR/VR/MR. A primary goal of the course is to reveal the logic of optical methodologies being critical to the design verification and production yield improvement for this
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