Compact, repetitively fired, gain-saturated x-ray lasers have been limited to wavelengths above λ=8.85 nm. Here we discuss their extension to λ = 6.85 nm by transient traveling wave excitation of Ni-like Gd ions in a plasma created with an optimized pre-pulse followed by rapid heating with an intense sub-ps pump pulse. Isoelectronic scaling also produced strong lasing at 6.67 nm and 6.11 nm in Ni-like Tb, and amplification at 6.41 nm and 5.85 nm in Ni-like Dy.
We will review recent progress in the development of high repetition, high average power rate soft x-ray lasers at 10-20 nm wavelength at Colorado State University, and the compact diode- pumped solid state lasers that drive them. The latter includes the development of a 1 J picosecond laser capable of operating at 500 Hz repetition rate. Results that demonstrate soft x-ray laser operation at the highest repetition rate reported to date: 400 Hz, and prospects of the use of these lasers in applications are discussed.
The table-top generation of high average power coherent soft x-ray radiation in a compact set up is of high interest for numerous applications. We have demonstrated the generation of bright soft x-ray laser pulses at 100 Hz repetition rate with record-high average power from compact plasma amplifiers excited by an ultrafast diode-pumped solid state laser. Results of compact λ=18.9nm Ni-like Mo and λ=13.9nm Ni-like Ag lasers operating at 100 Hz repetition rate are discussed.
An experiment was set up to measure the wavefront of an injection-seeded soft x-ray laser based on a solid-target plasma amplifier. The 43rd harmonic signal from a Ti:Sa laser was used to seed a molybdenum plasma amplifier operating in the λ=18.9 nm line of Ni-like Mo. A Hartmann wavefront senor with an accuracy of λ/32 rms at this wavelength was employed to measure the wavefront of both the high harmonics seed and the seeded soft x-ray lasers. A significant improvement in wavefront aberration from 0.51±0.04λ rms to 0.25±0.03λ rms was observed as a function of plasma column length. The variation of wavefront characteristic by the time delay between the injection of the seed and the peak of soft x-ray amplifier pump was studied in this paper.
We discuss recent advances in the development of high repetition rate table-soft soft x-ray lasers resulting from
research conducted at Colorado State University. Advancing saturated table-top lasers to shorter wavelengths we report
the operation of gain-saturated sub-10 nm table-top lasers at 1 Hz repetition rate. We also present experimental results
that show that injection-seeding of solid-target soft x-ray plasma amplifiers reduces the far field divergence by an order
of magnitude and to allow for control of the far-field beam characteristics by tailoring the divergence of the seed. We
finally discuss progress towards the development of high repetition rate compact all-diode-pumped soft x-ray lasers. We
have operated the front end of the diode-pumped soft-ray laser driver at 100Hz repetition rate, obtaining sub-5 ps optical
laser pulses of 100 mJ energy.
We describe our recent progress in the investigation of the spectral properties of collisional XUV lasers, including both
experimental measurements and numerical calculations. Using a wavefront-division, variable path-difference
interferometer, we have characterized the temporal coherence and the spectral width of an injection-seeded transient
XUV laser emitted at 18.9 nm from a Ni-like Mo plasma. Our results show that the temporal coherence of the beam is
significantly increased by the injection-seeded operation, compared to the standard ASE mode, in agreement with
detailed numerical simulations. Using the PPP code we have calculated the intrinsic linewidth of the same lasing line
over a range of electron density and at temperatures that are relevant to transient collisional pumping. We discuss the
relative contributions of homogeneous and inhomogeneous broadening to the overall profile.
We describe recent advances in the demonstration of table-top full field microscopes that use soft x-ray lasers for illumination. We have achieved wavelength resolution and single shot exposure operation with a very compact 46.9 nm microscope based on a desk-top size capillary discharge laser. This λ=46.9 nm microscope has been used to captured full field images of a variety of nanostructure systems and surfaces. In a separate development we have demonstrated a zone plate microscope that uses λ=13.2 nm laser illumination to image absorption defects in a extreme ultraviolet lithography (EUVL) mask in the same geometry used in a 4x demagnification EUVL stepper. Characterization of the microscope's transfer function shows it can resolve 55 nm half period patterns. With these capabilities, the λ=13.2 nm microscope is well suited for evaluation of pattern and defect printability of EUVL masks for the 22 nm node.
We report new advances in the development of high repetition rate table-top soft x-ray lasers. We have extended the gain-saturated operation of these lasers to 10.9 nm demonstrating a 1 Hz repetition rate laser operation in Ni-like tellurium with an average power of 1 microwatt. In a separate development we have demonstrated the first all-diodepumped soft x-ray laser. Lasing was achieved in the 18.9 nm line of Ni-like molybdenum in a plasma heated by a compact all-diode-pumped Yb:YAG laser. The solid state pump laser produces 8.5 ps pulses with up to 1 J energy at 10 Hz repetition rate. This diode-pumped laser has the potential to greatly increase the repetition rate and average power of soft x-ray lasers on a significantly smaller footprint. These compact soft X-ray lasers offer new scientific opportunities in small laboratory environments.
We present results on a table-top microscope that uses an EUV stepper geometry to capture full-field images with a halfpitch
spatial resolution of 55 nm. This microscope uses a 13.2 nm wavelength table-top laser for illumination and
acquires images of reflective masks with exposures of 20 seconds. These experiments open the path to the realization of
high resolution table-top imaging systems for actinic defect characterization.
We have recently demonstrated high repetition rate tabletop lasers operating at wavelengths as short as 10.9 nm
based on collisional transient excitation of ions in plasmas created by laser heating of solid targets. As a further step in
the development of these lasers into very high brightness and fully coherent soft x-ray sources, we have demonstrated
injection seeding of the amplifiers with high harmonic seed pulses. We report results of an experiment in which a 32.6
nm Ne-like Ti amplifier was used to amplify a seed pulse from the 25th harmonic of Ti:Sapphire into the gain saturation
regime. Simultaneous amplification of the 27th harmonic at 30.1 nm was also observed. The seeded soft x-ray laser beam
was measured to approach full spatial coherence. We have demonstrated that this scheme is scalable to shorter
wavelengths and that is capable of producing extremely bright soft x-ray laser pulse with essentially full coherence.
Hafnium oxide (HfO2) is undoubtedly one of the most desirable high-index optical coatings for high power
laser applications. One of the key goals in the fabrication of oxide films with high Laser Induced Damage
Threshold (LIDT) is to minimize the number of film imperfections, in particular stoichiometric defects. For
HfO2 films deposited by ion beam (reactive) sputtering (IBS) of a hafnium metal target, stoichiometry is
controlled by the injection of molecular oxygen, either close to the substrate or mixed with the sputtering
gas or some other combination. Good stoichiometry is important to reduce the density of unoxidized
particles buried in the coatings, which affect the LIDT. This work evaluates the potential advantages of
using pre-activation of oxygen in the IBS of HfO2, with special emphasis on its impact on LIDT and film
stress. For the experiments, oxygen was activated by an independent plasma source and then introduced
into a commercial IBS chamber. The optical properties of the films were characterized using
spectrophotometry and ellipsometry. Their structural quality and composition were determined from x-ray
diffraction and x-ray photoelectron emission spectroscopy. The stress was determined from interferometer
measurements. For optimized conditions, 2.5 J/cm2 LIDT was measured on HfO2 films at λ=800 nm with 1
ps and 25 mJ pulses from a chirped amplification Ti:Sapphire laser. In the range of oxygen variations under
consideration the effects on LIDT are shown to be minimal.
We have acquired images with sub-38 nm spatial resolution using a tabletop extreme ultraviolet (EUV) imaging system operating at a wavelength of 13.2 nm, which is within the bandwidth of Mo/Si lithography mirrors This zone plate-based, full-field microscope has the power to render images in only several seconds with up to a 10,000 μm2 field of view. The ability to acquire such high-resolution images using a compact EUV plasma laser source opens many possibilities for nanotechnology, including in-house actinic inspection of EUV lithography mask blanks.
We have demonstrated gain-saturated operation of high repetition rate table-top soft x-ray lasers producing microwatt average powers at wavelengths ranging from 13.2 to 32.6 nm in transitions of Ni-like and Ne-like ions. Lasing was also observed for shorter wavelength transitions of the 4d1S0→4p1P1 Ni-like isoelectronic sequence, with amplification approaching gain saturation in the 11.9 nm line of Ni-like Sn and progressively reduced gain for wavelengths as low as 10.9 nm in Ni-like Te. The results were obtained heating a pre-created plasma with a picosecond optical laser pulse with an energy of only 1 J impinging at optimized grazing angles of incidence for maximum pump energy deposition efficiency. This pumping geometry takes advantage of the refraction of the pump beam to increase the energy deposition efficiency of the pump beam into the gain region, making it possible to operate soft x-ray lasers in this wavelength range at significantly increased repetition rates. The results demonstrate the feasibility of producing high average powers of coherent radiation in the 100 eV spectral region for applications using a table-top source.
We report high resolution imaging results obtained utilizing small-scale extreme ultraviolet laser sources. A compact capillary-discharge pumped Ne-like Ar laser emitting at a wavelength of 46.9 nm was used to demonstrate imaging with nanometer-scale resolution in transmission and reflection modes. We exploited the large photon fluence of this short wavelength laser to obtain high-resolution images with exposure times as short as 1-10 seconds. Images with a spatial resolution better than 140 nm were obtained using the combination of a Sc/Si multilayer coated Schwarzschild condenser and free-standing objective zone plate. Preliminary results of imaging with a 13.9 nm extreme ultraviolet laser light are also discussed.
We report results of the development of capillary discharge driven metal-vapor plasma waveguides for the development of efficient laser-pumped soft x-ray lasers; and of the use of a previously developed capillary discharge Ne-like Ar 46.9 nm laser in study of the interaction of intense soft x-ray laser with materials. The guiding of a laser beam in a dense capillary discharge plasma channel containing a large density of Ag ions is reported. In term of applications we have conducted studies of materials modification and ablation with focalized 46.9 nm laser radiation at fluences between
0.1 and 100 J cm-2. The experiments demonstrated that the combined high repetition rate and high energy per pulse of the capillary discharge laser allows for the first time the processing of large surface areas with intense soft x-ray laser radiation. The damage threshold and damage mechanism of extreme ultraviolet Sc/Si multilayer mirror coatings was studied . Damage threshold fluences of ~ 0.08 J/cm2 were determined for coatings deposited on both borosilicate glass and Si substrates. Scanning and transmission electron microscopy, and small-angle X-ray diffraction techniques revealed the thermal nature of the damage mechanism. These results provide a benchmark for the use of Sc/Si multilayer mirrors in high fluence applications, and for the development of higher damage threshold mirrors. Soft x-ray laser ablation studies were also conducted for silicon and several plastic materials, including PMMA, Polyamide and PTFE.
We report the generation and characterization of plasma waveguides in a highly ionized Ar plasma created by a fast capillary discharge. Their results are of interest for the efficient longitudinal laser excitation of collisional soft x-ray lasers. A discharge-driven hydrodynamic compression guides progressively lower order modes through a plasma with increasing density and degree of ionization. The mode structure and guiding properties were investigated using near and far field imaging, and transmission measurements. The lowest order mode (FWHM diameter ~ 50 um) is guided with an energy transmission of ~ 75% over a 5.5 cm long plasma a fraction of a ns before the discharge plasma column reaches the conditions for lasing in Ne-like Ar. The rapid expansion of the highly ionized plasma column after the pinch forms a significantly more leaky and absorbent waveguide.
During recent months we have continued investigations of many different aspects of x-ray lasers to characterize and improve the source and applications. This work has included temporal characterization of existing laser-heated x-ray lasers under a wide range of pumping conditions. We have also looked into more details at different applications of x-ray lasers among which was the interferometry of laser-produced and capillary discharge plasmas in several irradiation conditions for different target Z materials. The reduction of pump energy remains the most important for the generation of new compact x-ray lasers. Numerical studies show that there are some ways to improve several of the key parameters of x-ray lasers specifically repetition rates and efficiency.
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