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Yorrick Exbrayat
at CEA-LETI
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Publications (1)
Proceedings Article | 10 April 2024 Poster
Impact of process parameters on grayscale MEEF
Ujwol Palanchoke, Florian Tomaso, Yorrick Exbrayat, Gaby Bélot, Marie-Line Pourteau, Ivanie Mendes, Juline Saugnier, Aurélien Fay, Sébastien Bérard-Bergery, Elodie Sungauer, Charlotte Beylier, Rémi Coquand, Arthur Bernadac
Proceedings Volume PC12956, PC129560Y (2024) https://doi.org/10.1117/12.3010850
KEYWORDS: Photoresist processing, Process control, Profilometers, Semiconductors, 3D acquisition, 3D microstructuring, Data modeling, 3D modeling, Grayscale lithography, 3D mask effects
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