Mr. Zhong Zhang Profile

Zhong Zhang

Staff R&D Engineer

SPIE Involvement:

Author

Area of Expertise:

Lithography , LER , Metrology , LCDU , Nanoimprint

Publications (3)

Proceedings Article | 21 November 2023 Poster + Paper

Research of mask photoresist sensitivity for local critical dimension uniformity improvement in ArF lithography

Yilei Zeng, Yi Cheng, Yu Zhang, Peisheng Li, Zhong Zhang, Min Zhou, Xin Zhang

Proceedings Volume 12751, 1275119 (2023) https://doi.org/10.1117/12.2687170

KEYWORDS: Photoresist materials, Lithography, Semiconducting wafers, Advanced patterning, Semiconductors, Photoresist developing, Shrinkage, Power consumption, Line width roughness, Line edge roughness

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Proceedings Article | 28 April 2023 Poster + Paper

Comprehensive investigation on improvement of local CDU for sub-20nm DRAM devices

Zhong Zhang, Yang Zhang, Liang Zhu, Yi Cheng, Hui Dong, Kaige Gong, Jingjing Zhao, Jun Xu, Alex Ren

Proceedings Volume 12494, 124941H (2023) https://doi.org/10.1117/12.2657250

KEYWORDS: Photoresist materials, Source mask optimization, Reticles, Etching, Light sources and illumination, Optical lithography, Lithography, Image enhancement, Phase shifts, Nanoimprint lithography, Deep ultraviolet

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Proceedings Article | 1 December 2022 Poster + Paper

Research of high-transmission phase-shift mask on critical dimension uniformity in ArF lithography

Yilei Zeng, Yi Cheng, Peisheng Li, Teng Zhang, Zhong Zhang, Yu Zhang, Debao Ding

Proceedings Volume 12293, 122930X (2022) https://doi.org/10.1117/12.2641687

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Nanoimprint lithography, Phase shifts, Metrology, Scanning electron microscopy, Polarization, Lithographic illumination, Transmittance

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