Mr. Chris E. Jones Profile

Chris E. Jones

CMOS Applications Manager at Canon Nanotechnologies Inc

SPIE Involvement:

Author

Area of Expertise:

Nanoimprint Lithography , Metrology , Process Development

Publications (13)

Proceedings Article | 3 October 2018 Paper

High volume semiconductor manufacturing using nanoimprint lithography

Zenichi Hamaya, Junichi Seki, Toshiya Asano, Keita Sakai, Ali Aghili, Makoto Mizuno, Jin Choi, Chris Jones

Proceedings Volume 10810, 108100F (2018) https://doi.org/10.1117/12.2501008

KEYWORDS: Photomasks, Particles, Semiconducting wafers, Nanoimprint lithography, Mask cleaning, Polishing, Overlay metrology, Control systems, Surface finishing, Optical lithography

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Proceedings Article | 19 March 2018 Paper

Performance of a nanoimprint mask replication system

Atsushi Kimura, Kohei Imoto, Chiaki Sato, Kiyohito Yamamoto, Hiroshi Inada, Mitsuru Hiura, Takehiko Iwanaga, Ali Aghili, Makoto Mizuno, Jin Choi, Chris Jones

Proceedings Volume 10584, 105840Q (2018) https://doi.org/10.1117/12.2299636

KEYWORDS: Photomasks, Particles, Semiconducting wafers, Nanoimprint lithography, Optical lithography, Mask cleaning, Lithography, Manufacturing equipment, Capillaries, Ultraviolet radiation

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Proceedings Article | 13 July 2017 Paper

Improved particle control for high volume semiconductor manufacturing for nanoimprint lithography

Masami Yonekawa, Takahiro Nakayama, Kazuki Nakagawa, Toshihiro Maeda, Yoichi Matsuoka, Keiji Emoto, Hisanobu Azuma, Yukio Takabayashi, Ali Aghili, Makoto Mizuno, Jin Choi, Chris Jones

Proceedings Volume 10454, 104540R (2017) https://doi.org/10.1117/12.2279365

KEYWORDS: Semiconducting wafers, Curtains, Polishing, Lithography, Liquids, Ceramics, Nanoimprint lithography, Particles, Control systems, Semiconductor manufacturing, Photomasks

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Proceedings Article | 21 March 2017 Paper

Improved defectivity and particle control for nanoimprint lithography high-volume semiconductor manufacturing

Takahiro Nakayama, Masami Yonekawa, Yoichi Matsuoka, Hisanobu Azuma, Yukio Takabayashi, Ali Aghili, Makoto Mizuno, Jin Choi, Chris Jones

Proceedings Volume 10144, 1014407 (2017) https://doi.org/10.1117/12.2257647

KEYWORDS: Photomasks, Particles, Nanoimprint lithography, Lithography, Semiconductors, Control systems, Semiconductor manufacturing, Ultraviolet radiation, Optical lithography, Semiconducting wafers, Curtains, Ceramics, Surface finishing, Polishing

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Proceedings Article | 4 October 2016 Paper

Nanoimprint wafer and mask tool progress and status for high volume semiconductor manufacturing

Yoichi Matsuoka, Junichi Seki, Takahiro Nakayama, Kazuki Nakagawa, Hisanobu Azuma, Kiyohito Yamamoto, Chiaki Sato, Fumio Sakai, Yukio Takabayashi, Ali Aghili, Makoto Mizuno, Jin Choi, Chris Jones

Proceedings Volume 9985, 99851G (2016) https://doi.org/10.1117/12.2243114

KEYWORDS: Photomasks, Lithography, Nanoimprint lithography, Semiconducting wafers, Semiconductors, Particles, Semiconductor manufacturing, Curtains, Image resolution, Manufacturing

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Proceedings Article | 22 March 2016 Paper

Defectivity and particle reduction for mask life extension, and imprint mask replication for high-volume semiconductor manufacturing

Keiji Emoto, Fumio Sakai, Chiaki Sato, Yukio Takabayashi, Hitoshi Nakano, Tsuneo Takabayashi, Kiyohito Yamamoto, Tadashi Hattori, Mitsuru Hiura, Toshiaki Ando, Yoshio Kawanobe, Hisanobu Azuma, Takehiko Iwanaga, Jin Choi, Ali Aghili, Chris Jones, J. W. Irving, Brian Fletcher, Zhengmao Ye

Proceedings Volume 9777, 97770C (2016) https://doi.org/10.1117/12.2219036

KEYWORDS: Photomasks, Particles, Nanoimprint lithography, Lithography, Semiconductors, Control systems, Semiconductor manufacturing, Ultraviolet radiation, Optical lithography, Dry etching, Semiconducting wafers, Curtains, Liquids, Ceramics, Overlay metrology

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Proceedings Article | 14 October 2011 Paper

Mask replication using jet and flash imprint lithography

Kosta Selinidis, Chris Jones, Gary Doyle, Laura Brown, Joseph Imhof, Dwayne LaBrake, Douglas Resnick, S. Sreenivasan

Proceedings Volume 8166, 816627 (2011) https://doi.org/10.1117/12.898865

KEYWORDS: Photomasks, Chromium, Etching, Lithography, Semiconductors, Semiconducting wafers, Particles, Optical lithography, Optical alignment, Inspection

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SPIE Journal Paper | 1 October 2011

Mask replication using jet and flash imprint lithography

Kosta Selinidis, Cynthia Brooks, Gary Doyle, Laura Brown, Chris Jones, Joseph Imhof, Dwayne LaBrake, Douglas Resnick, S. Sreenivasan

JM3, Vol. 10, Issue 04, 043005, (October 2011) https://doi.org/10.1117/12.10.1117/1.3646523

KEYWORDS: Photomasks, Chromium, Lithography, Etching, Electron beam lithography, Semiconductors, Semiconducting wafers, Inspection, Optical alignment, Silica

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Proceedings Article | 2 April 2011 Paper

Progress in mask replication using jet and flash imprint lithography

Kosta Selinidis, Cynthia Brooks, Gary Doyle, Laura Brown, Chris Jones, Joseph Imhof, Dwayne LaBrake, Douglas Resnick, S.V. Sreenivasan

Proceedings Volume 7970, 797009 (2011) https://doi.org/10.1117/12.881647

KEYWORDS: Photomasks, Etching, Chromium, Lithography, Semiconductors, Inspection, Semiconducting wafers, Silica, Electron beam lithography, Optical alignment

Read Abstract +

The Jet and Flash Imprint Lithography (J-FIL^TM) process uses drop dispensing of UV curable resists to assist high resolution patterning for subsequent dry etch pattern transfer. The technology is actively being used to develop solutions for memory markets including Flash memory and patterned media for hard disk drives. It is anticipated that the lifetime of a single template (for patterned media) or mask (for semiconductor) will be on the order of 10⁴ - 10⁵imprints. This suggests that tens of thousands of templates/masks will be required to satisfy the needs of a manufacturing environment. Electron-beam patterning is too slow to feasibly deliver these volumes, but instead can provide a high quality "master" mask which can be replicated many times with an imprint lithography tool. This strategy has the capability to produce the required supply of "working" templates/masks. In this paper, we review the development of the mask form factor, imprint replication tools and processes specifically for semiconductor applications. The requirements needed for semiconductors dictate the need for a well defined form factor for both master and replica masks which is also compatible with the existing mask infrastructure established for the 6025 semi standard, 6" x 6" x 0.25" photomasks. Complying with this standard provides the necessary tooling needed for mask fabrication processes, cleaning, metrology, and inspection. The replica form factor has additional features specific to imprinting such as a pre-patterned mesa. A Perfecta^TM MR5000 mask replication tool has been developed specifically to pattern replica masks from an e-beam written master. The system specifications include a throughput of four replicas per hour with an added image placement component of 5nm, 3sigma and a critical dimension uniformity error of less than 1nm, 3sigma. A new process has been developed to fabricate replicas with high contrast alignment marks so that designs for imprint can fit within current device layouts and maximize the usable printed area on the wafer. Initial performance results of this marks are comparable to the baseline fused silica align marks.

Proceedings Article | 12 May 2007 Paper

Step and flash imprint lithography template fabrication for emerging market applications

Douglas Resnick, Gerard Schmid, Mike Miller, Gary Doyle, Chris Jones, Dwayne LaBrake

Proceedings Volume 6607, 66070T (2007) https://doi.org/10.1117/12.728943

KEYWORDS: Semiconducting wafers, Lithography, Photonic crystals, Etching, Silica, Electron beam lithography, Chromium, Silicon, Light emitting diodes, Polymethylmethacrylate

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Proceedings Article | 13 February 2007 Paper

Manufacturing implications for photonic crystal patterning using imprint lithography

Chris Jones, David Lentz, Gary Doyle, Mike Miller, Maha Ganapathisubramanian, Xiaoming Lu, Doug Resnick, Dwayne LaBrake

Proceedings Volume 6486, 64860Q (2007) https://doi.org/10.1117/12.715220

KEYWORDS: Semiconducting wafers, Lithography, Photonic crystals, Light emitting diodes, Optical lithography, Etching, Manufacturing, Photomasks, Gallium nitride, Ultraviolet radiation

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Proceedings Article | 12 September 2006 Paper

2D photonic crystal patterning for high-volume LED manufacturing

Rob Hershey, Mike Miller, Chris Jones, Mahadevan Ganapathi Subramanian, Xiaoming Lu, Gary Doyle, David Lentz, Dwayne LaBrake

Proceedings Volume 6337, 63370M (2006) https://doi.org/10.1117/12.681481

KEYWORDS: Semiconducting wafers, Light emitting diodes, Photonic crystals, Manufacturing, Etching, Photomasks, Electron beam lithography, Particles, Quartz, Lithography

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Proceedings Article | 5 July 1996 Paper

Organic conductor/high-Tc superconductor bilayer structures

Marvin Clevenger, Christopher Jones, Steven Haupt, Jianai Zhao, John McDevitt

Proceedings Volume 2697, (1996) https://doi.org/10.1117/12.250265

KEYWORDS: Superconductors, Polymers, Resistance, Superconductivity, Metals, Technetium, Semiconductors, Polymer thin films, Modulation, Interfaces

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Showing 5 of 13 publications

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