Presentation + Paper
27 April 2023 Multi-modal tabletop EUV reflectometry for characterization of nanostructures
Author Affiliations +
Abstract
We present a tabletop EUV imaging reflectometer that can characterize the geometry and composition of nanostructures. The setup can be operated in multiple modes — intensity reflectometry, scatter-reflectometry, or imaging reflectometry depending on the length scales and periodicity of the nanostructures present. All these modes of metrology can be performed non-destructively and in a lab-scale setup, using a tabletop high-harmonic coherent EUV source.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuka Esashi, Nicholas W. Jenkins, Michael Tanksalvala, Yunzhe Shao, Brendan McBennett, Joshua L. Knobloch, Henry C. Kapteyn, and Margaret M. Murnane "Multi-modal tabletop EUV reflectometry for characterization of nanostructures", Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 1249614 (27 April 2023); https://doi.org/10.1117/12.2658543
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KEYWORDS
Reflectometry

Extreme ultraviolet

Nanostructures

Diffraction

Metrology

Surface roughness

Chemical composition

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