Performance data from the EBES4 high-speed reticle generator

D. C. Fowlis; Darryl Peters; C. M. Rose; A. R. von Neida; Herbert A. Waggener; William P. Wilson

doi:10.1117/12.142146

26 March 1993 Performance data from the EBES4 high-speed reticle generator

D. C. Fowlis, Darryl Peters, C. M. Rose, A. R. von Neida, Herbert A. Waggener, William P. Wilson

Proceedings Volume 1809, 12th Annual BACUS Symposium on Photomask Technology and Management; (1993) https://doi.org/10.1117/12.142146
Event: Photomask Technology, 1992, Sunnyville, CA, United States

Abstract

Performance specifications, electron gun parameters, testing results to date, and throughput are presented for the second prototype EBES4 which is entering manufacture. The thermal field emitter electron gun is designed for high flux, high current stability, and a long lifetime. The gun produces 250 nA into a 125 nm diameter spot for a flux of 2000 A/cm² with a beam current drift of <= 0.5%/hour. Minimum address size for EBES4 files is 1/64 micrometers (16 nm). Measurements of butting and shear errors for the 256 micrometers stripe and 32 micrometers subfield boundaries indicated an accuracy (mean + 3(sigma) ) of <= 60 nm without correcting for reading precision. Image placement accuracy (mean + 3(sigma) ) of <= 50 nm was measured on an LMS 2000 for MARKET cross arrays spanning 100 mm X 100 mm. Overlay accuracy (mean + 3 (sigma) ) for multi-point alignment of three masks was measured as <= 50 nm with a maximum error of <= 30 nm.

Citation Download Citation

D. C. Fowlis, Darryl Peters, C. M. Rose, A. R. von Neida, Herbert A. Waggener, and William P. Wilson "Performance data from the EBES4 high-speed reticle generator", Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); https://doi.org/10.1117/12.142146

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