Optical properties of atomic layer deposited materials and their application in silicon waveguides

Tapani Alasaarela; Jussi Hiltunen; Amit Khanna; Antti Säynätjoki; Ari Tervonen; Seppo Honkanen

doi:10.1117/12.841524

25 February 2010 Optical properties of atomic layer deposited materials and their application in silicon waveguides

Tapani Alasaarela, Jussi Hiltunen, Amit Khanna, Antti Säynätjoki, Ari Tervonen, Seppo Honkanen

Proceedings Volume 7598, Optical Components and Materials VII; 75980D (2010) https://doi.org/10.1117/12.841524
Event: SPIE OPTO, 2010, San Francisco, California, United States

Abstract

Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO₂ and Al₂O₃ films are promising for the waveguide purposes. Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al₂O₃ layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications. Experimental coating of silicon waveguides is discussed.

Citation Download Citation

Tapani Alasaarela, Jussi Hiltunen, Amit Khanna, Antti Säynätjoki, Ari Tervonen, and Seppo Honkanen "Optical properties of atomic layer deposited materials and their application in silicon waveguides", Proc. SPIE 7598, Optical Components and Materials VII, 75980D (25 February 2010); https://doi.org/10.1117/12.841524

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