Editorial
Kenji Yamazoe, Chris Mack
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 020101, (June 2019) https://doi.org/10.1117/1.JMM.18.2.020101
Open Access
TOPICS: Coherence (optics), Coherence imaging, Lithography, Image transmission, Computer simulations, Standards development, Diffraction, Zernike polynomials, Mathematics, Lithographic illumination
JM3 Letters
Eugen Pavel, Gabriel Prodan, Virgil Marinescu, Roxana Trusca
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 020501, (May 2019) https://doi.org/10.1117/1.JMM.18.2.020501
TOPICS: Optical lithography, Transmission electron microscopy, Silicon, Scanning electron microscopy, Lithography, Prototyping, Nanostructures, Diffraction, Excitons, Semiconductors
Classic Paper
Hideya Gamo
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 021101, (June 2019) https://doi.org/10.1117/1.JMM.18.2.021101
Open Access
TOPICS: Mathematics, Light sources, Coherence (optics), Imaging systems, Transmittance, Information theory, Optical imaging, Matrices, Fourier transforms, Applied physics
Special Section on Control of Integrated Circuit Patterning Variance, Part 4: Placement and Critical Dimension, Edge to Edge Overlay
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 021201, (June 2019) https://doi.org/10.1117/1.JMM.18.2.021201
Open Access
TOPICS: Overlay metrology, Scanning electron microscopy, Metrology, Optical lithography, Integrated circuits, Edge detection, Critical dimension metrology, Control systems, Distance measurement, Data analysis
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 021202, (April 2019) https://doi.org/10.1117/1.JMM.18.2.021202
Open Access
TOPICS: Overlay metrology, Error analysis, Optical lithography, Metals, Composites, Semiconducting wafers, Received signal strength, Semiconductors, Control systems, Double patterning technology
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 021203, (April 2019) https://doi.org/10.1117/1.JMM.18.2.021203
TOPICS: Scanning electron microscopy, Overlay metrology, Semiconducting wafers, Error analysis, Etching, Metrology, Distance measurement, Control systems, Lithography, Scanners
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 021204, (April 2019) https://doi.org/10.1117/1.JMM.18.2.021204
TOPICS: Critical dimension metrology, Monte Carlo methods, Electron microscopes, Scanning electron microscopy, Cadmium, Edge detection, Silicon, Optical simulations, Metrology, Inspection
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 021205, (April 2019) https://doi.org/10.1117/1.JMM.18.2.021205
Open Access
TOPICS: Inspection, Scanning electron microscopy, Capacitance, Resistance, Nanowires, Field effect transistors, Silicon, Transmission electron microscopy, Selenium, Semiconducting wafers
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 021206, (June 2019) https://doi.org/10.1117/1.JMM.18.2.021206
Open Access
TOPICS: Overlay metrology, Scanning electron microscopy, Metrology, Semiconducting wafers, Etching, Selenium, Signal detection, Edge detection, Manufacturing, Scanners
Lithography
Rohit Dawar, Samit Barai, Pardeep Kumar, Babji Srinivasan, Nihar Mohapatra
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 023501, (May 2019) https://doi.org/10.1117/1.JMM.18.2.023501
TOPICS: Lithography, Optical proximity correction, Image processing, Feature extraction, Machine learning, Photomasks, Data modeling, Image classification, Calibration, Binary data
Abrar Faisal, Thomas Beckenbach, Jürgen Mohr, Pascal Meyer
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 023502, (May 2019) https://doi.org/10.1117/1.JMM.18.2.023502
Open Access
TOPICS: X-ray lithography, Photomasks, Gold, X-rays, Photoresist materials, Near field diffraction, Titanium, Electrons, Photons, Scanning electron microscopy
Xiaojing Su, Dong Shen, Yayi Wei, Taian Fan, Lisong Dong, Libin Zhang, Yajuan Su, Rui Chen, Tianchun Ye
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 023503, (May 2019) https://doi.org/10.1117/1.JMM.18.2.023503
TOPICS: Line edge roughness, Failure analysis, Bridges, Etching, Lithography, Probability theory, Overlay metrology, Photomasks, Metals, Optical proximity correction
Michael Eller, Mingqi Li, Xisen Hou, Stanislav Verkhoturov, Emile Schweikert, Peter Trefonas
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 023504, (June 2019) https://doi.org/10.1117/1.JMM.18.2.023504
TOPICS: Ions, Polymers, Silicon, Photoresist materials, Mass spectrometry, Molecules, Photoresist developing, Neodymium, Gold, Chemical analysis
Susumu Iida, Takamitsu Nagai, Takayuki Uchiyama
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 023505, (June 2019) https://doi.org/10.1117/1.JMM.18.2.023505
TOPICS: Semiconducting wafers, Palladium, Inspection, Standards development, Scanning electron microscopy, Etching, Lithography, Defect detection, Electron beam lithography, Silicon
Metrology
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 024001, (April 2019) https://doi.org/10.1117/1.JMM.18.2.024001
TOPICS: Scanning electron microscopy, Neural networks, Line width roughness, Denoising, Line edge roughness, Machine learning, Monte Carlo methods, Computer simulations, Convolutional neural networks, Wavelets
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 024002, (May 2019) https://doi.org/10.1117/1.JMM.18.2.024002
Open Access
TOPICS: Stochastic processes, Inspection, Cadmium, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Critical dimension metrology, Integrated circuits, Defect inspection
Guillaume Freychet, Isvar Cordova, Terry McAfee, Dinesh Kumar, Ronald Pandolfi, Chris Anderson, Scott Dhuey, Patrick Naulleau, Cheng Wang, Alexander Hexemer
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 024003, (May 2019) https://doi.org/10.1117/1.JMM.18.2.024003
Open Access
TOPICS: Scattering, X-rays, 3D image reconstruction, Extreme ultraviolet, X-ray imaging, Extreme ultraviolet lithography, 3D image processing, Modulation, Carbon, Image enhancement
Microfabrication
Na Zhou, Junjie Li, Henry Radamson, Lin Li, Qifeng Jiang, Junfeng Li
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 024501, (May 2019) https://doi.org/10.1117/1.JMM.18.2.024501
TOPICS: Etching, Silicon, Polymers, Ions, Lithium, Semiconducting wafers, Photomasks, Image processing, Scanning electron microscopy, Deep reactive ion etching
Microelectromechanical systems (MEMS)
Ahmad Elshenety, Elwy El-Kholy, Ahmed Abdou, Mostafa Soliman, Mohsen Elhagry, Walaa Gado
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 025001, (June 2019) https://doi.org/10.1117/1.JMM.18.2.025001
TOPICS: Sensors, Polymers, Gas sensors, Polymeric sensors, Actuators, Microelectromechanical systems, Metals, Oxides, Resistance, Toxic gases
Micro-optoelectromechanical systems (MOEMS)
Yu Zhou, Cyrus Shafai, James Dietrich
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 02, 025501, (May 2019) https://doi.org/10.1117/1.JMM.18.2.025501
TOPICS: Actuators, Electrodes, Deformable mirrors, Etching, Silicon, Semiconducting wafers, Mirrors, Chemical elements, Microelectromechanical systems, Signal attenuation
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