Dr. Amr Y. Abdo Profile

Dr. Amr Y. Abdo

Senior Member of Technical Staff at GlobalFoundries

SPIE Involvement:

Author

Publications (32)

Proceedings Article | 23 October 2017 Paper

The impact of inconsistency in assist feature generation on OPC performance

Amr Abdo, Ramya Viswanathan, Donald Samuels, David Conklin

Proceedings Volume 10451, 104510V (2017) https://doi.org/10.1117/12.2281968

KEYWORDS: SRAF, Semiconducting wafers, Data modeling, Optical proximity correction, Photomasks, Printing, Resolution enhancement technologies, Optical lithography, Critical dimension metrology, Performance modeling

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Proceedings Article | 18 March 2015 Paper

Experiments using automated sample plan selection for OPC modeling

Ramya Viswanathan, Om Jaiswal, Nathalie Casati, Amr Abdo, James Oberschmidt, Josef Watts, Maria Gabrani

Proceedings Volume 9426, 94260W (2015) https://doi.org/10.1117/12.2086049

KEYWORDS: Statistical modeling, Surface plasmons, Calibration, Data modeling, Optical proximity correction, Metrology, Semiconducting wafers, Optical lithography, Integrated circuit design, Mathematical modeling

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Proceedings Article | 31 March 2014 Paper

Automated sample plan selection for OPC modeling

Nathalie Casati, Maria Gabrani, Ramya Viswanathan, Zikri Bayraktar, Om Jaiswal, David DeMaris, Amr Abdo, James Oberschmidt, Andreas Krause

Proceedings Volume 9052, 90520J (2014) https://doi.org/10.1117/12.2045461

KEYWORDS: Data modeling, Surface plasmons, Calibration, Optical proximity correction, Statistical modeling, Optical lithography, Process modeling, Printing, Image processing, Image quality

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Proceedings Article | 14 October 2011 Paper

Using custom features to check OPC model performance

Amr Abdo, Ramya Viswanathan

Proceedings Volume 8166, 81663R (2011) https://doi.org/10.1117/12.901125

KEYWORDS: Optical proximity correction, Printing, Performance modeling, Process modeling, Semiconducting wafers, Photomasks, Calibration, Scanning electron microscopy, Lithography, Data modeling

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Proceedings Article | 3 April 2010 Paper

3D physical modeling for patterning process development

Chandra Sarma, Amr Abdo, Todd Bailey, Will Conley, Derren Dunn, Sajan Marokkey, Mohamed Talbi

Proceedings Volume 7641, 76410B (2010) https://doi.org/10.1117/12.846637

KEYWORDS: 3D modeling, Critical dimension metrology, Data modeling, Process modeling, Scanning electron microscopy, Semiconducting wafers, Etching, Optical lithography, Printing, 3D image processing

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Proceedings Article | 13 March 2010 Paper

Three-dimensional physical photoresist model calibration and profile-based pattern verification

Mohamed Talbi, Amr Abdo, Todd Bailey, Will Conley, Derren Dunn, Masashi Fujimoto, John Nickel, No Young Chung, Sajan Marokkey, Si Hyeung Lee, Chandrasekhar Sarma, Dongbing Shao, Ramya Viswanathan

Proceedings Volume 7640, 76401D (2010) https://doi.org/10.1117/12.846466

KEYWORDS: 3D modeling, Photoresist materials, Data modeling, Calibration, Scanning electron microscopy, Critical dimension metrology, Photomasks, 3D image processing, Statistical modeling, Optical lithography

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Proceedings Article | 4 March 2010 Paper

Automation of sample plan creation for process model calibration

James Oberschmidt, Amr Abdo, Tamer Desouky, Mohamed Al-Imam, Azalia Krasnoperova, Ramya Viswanathan

Proceedings Volume 7640, 76401G (2010) https://doi.org/10.1117/12.846276

KEYWORDS: Calibration, Process modeling, Statistical modeling, Data modeling, Photoresist processing, Lithography, Computer simulations, Image processing, Metrology, Optical proximity correction

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Proceedings Article | 4 March 2010 Paper

The feasibility of using image parameters for test pattern selection during OPC model calibration

Amr Abdo, Ramya Viswanathan

Proceedings Volume 7640, 76401E (2010) https://doi.org/10.1117/12.846686

KEYWORDS: Data modeling, Optical proximity correction, Performance modeling, Calibration, Statistical modeling, Nano opto mechanical systems, Metrology, Time metrology, Systems modeling, Integrated circuits

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Proceedings Article | 16 March 2009 Paper

A new method for post-etch OPC modeling to compensate for underlayer effects from integrated wafers

Chandra Sarma, Amr Abdo, Derren Dunn, Daniel Fischer, Klaus Herold, Scott Mansfield, Len Tsou

Proceedings Volume 7274, 72740Z (2009) https://doi.org/10.1117/12.813546

KEYWORDS: Semiconducting wafers, Etching, Data modeling, Optical proximity correction, Instrument modeling, Critical dimension metrology, Photomasks, Data integration, Integrated modeling, Photoresist processing

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Proceedings Article | 17 October 2008 Paper

Single exposure is still alive: gate patterning at 45nm technology node

Klaus Herold, Donald Samuels, Derren Dunn, Amr Abdo, Chandrasekhar Sarma

Proceedings Volume 7122, 71220W (2008) https://doi.org/10.1117/12.801526

KEYWORDS: Optical proximity correction, Optical lithography, Etching, Double patterning technology, Process modeling, Photomasks, Semiconducting wafers, Computer simulations, Tolerancing, Manufacturing

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Proceedings Article | 17 October 2008 Paper

Improvements in accuracy of dense OPC models

Chidam Kallingal, James Oberschmidt, Ramya Viswanathan, Amr Abdo, OSeo Park

Proceedings Volume 7122, 71221Q (2008) https://doi.org/10.1117/12.801695

KEYWORDS: Optical proximity correction, Diffusion, Data modeling, Optimization (mathematics), Calibration, Critical dimension metrology, Cadmium, Semiconducting wafers, Model-based design, Photoresist processing

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Proceedings Article | 2 April 2008 Paper

The comparison of OPC performance and run time for dense versus sparse solutions

Amr Abdo, Ian Stobert, Ramya Viswanathan, Ryan Burns, Klaus Herold, Chidam Kallingal, Jason Meiring, James Oberschmidt, Scott Mansfield

Proceedings Volume 6924, 69243G (2008) https://doi.org/10.1117/12.772902

KEYWORDS: Optical proximity correction, Data modeling, Scanning electron microscopy, Computer simulations, Calibration, Performance modeling, Resolution enhancement technologies, Semiconducting wafers, Lithography, Wafer-level optics

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Proceedings Article | 1 November 2007 Paper

The effect of the OPC parameters on the performance of the OPC model

Amr Abdo, Ahmed Seoud, Alexander Wei, Ian Stobert, Alan Leslie

Proceedings Volume 6730, 673055 (2007) https://doi.org/10.1117/12.746696

KEYWORDS: Optical proximity correction, Performance modeling, Optimization (mathematics), Critical dimension metrology, Resolution enhancement technologies, Photomasks, Integrated circuits, Lithography, Systems modeling, Optics manufacturing

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Proceedings Article | 20 October 2006 Paper

The effect of OPC optical and resist model parameters on the model accuracy, run time, and stability

Amr Abdo, Rami Fathy, Ahmed Seoud, James Oberschmidt, Scott Mansfield, Mohamed Talbi

Proceedings Volume 6349, 634923 (2006) https://doi.org/10.1117/12.686093

KEYWORDS: Optical proximity correction, Data modeling, Performance modeling, Diffusion, Optics manufacturing, Scanning electron microscopy, Model-based design, Calibration, Apodization, Optical lithography

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Proceedings Article | 24 March 2006 Paper

Model-based calculation of weighting in OPC model calibration

Mohamed Talbi, Amr Abdo, Daniel Fischer, Geng Han, Scott Mansfield, James Oberschmidt, Ramya Viswanathan

Proceedings Volume 6152, 615202 (2006) https://doi.org/10.1117/12.656568

KEYWORDS: Optical proximity correction, Data modeling, Calibration, Scanning electron microscopy, Statistical modeling, Model-based design, Error analysis, Metrology, Statistical analysis, Computer simulations

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Proceedings Article | 14 March 2006 Paper

Meeting critical gate linewidth control needs at the 65 nm node

Arpan Mahorowala, Scott Halle, Allen Gabor, William Chu, Alexandra Barberet, Donald Samuels, Amr Abdo, Len Tsou, Wendy Yan, Seiji Iseda, Kaushal Patel, Bachir Dirahoui, Asuka Nomura, Ishtiaq Ahsan, Faisal Azam, Gary Berg, Andrew Brendler, Jeffrey Zimmerman, Tom Faure

Proceedings Volume 6156, 61560M (2006) https://doi.org/10.1117/12.659427

KEYWORDS: Critical dimension metrology, Etching, Semiconducting wafers, Photomasks, Optical proximity correction, Lithography, Cadmium, Reticles, Control systems, Immersion lithography

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Proceedings Article | 9 November 2005 Paper

The effect of calibration feature weighting on OPC optical and resist models: investigating the influence on model coefficients and on the overall model fitting

Amr Abdo, Rami Fathy, Kareem Madkour, James Oberschmidt, Daniel Fischer, Mohamed Talbi

Proceedings Volume 5992, 599253 (2005) https://doi.org/10.1117/12.631817

KEYWORDS: Calibration, Optical proximity correction, Data modeling, Process modeling, 3D modeling, Optimization (mathematics), Model-based design, Photoresist processing, Integrated circuits, Optical lithography

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SPIE Journal Paper | 1 January 2005

Simulation of the coupled thermal/optical effects for liquid immersion nanolithography

So-Yeon Baek, Alexander Wei, Daniel Cole, Gregory Nellis, Michael Yeung, Amr Abdo, Roxann Engelstad, Mordechai Rothschild, Michael Switkes

JM3, Vol. 4, Issue 01, 013002, (January 2005) https://doi.org/10.1117/12.10.1117/1.1858331

KEYWORDS: Semiconducting wafers, Liquids, Thermal effects, Microfluidics, Wafer-level optics, Refraction, Computational fluid dynamics, Optical lithography, Microfluidic imaging, Photomasks

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Proceedings Article | 2 June 2004 Paper

Predicting microfluidic response during immersion lithography scanning

Alexander Wei, Gerald Dicks, Amr Abdo, Gregory Nellis, Roxann Engelstad, Jaehyuk Chang, Edward Lovell, William Beckman

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568024

KEYWORDS: Liquids, Semiconducting wafers, Immersion lithography, Polymers, Microfluidics, Refraction, Absorption, Optical simulations, Refractive index, Wafer-level optics

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Proceedings Article | 28 May 2004 Paper

Simulation of the coupled thermal optical effects for liquid immersion micro-/nano-lithography

So-Yeon Baek, Alexander Wei, Daniel Cole, Greg Nellis, Michael Yeung, Amr Abdo, Roxann Engelstad

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537574

KEYWORDS: Semiconducting wafers, Liquids, Thermal effects, Protactinium, Wafer-level optics, Refraction, Computational fluid dynamics, Microfluidics, Immersion lithography, Microfluidic imaging

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Proceedings Article | 28 May 2004 Paper

Equivalent modeling technique for predicting the transient thermomechanical response of optical reticles during exposure

Amr Abdo, Roxann Engelstad, William Beckman, Edward Lovell, John Mitchell

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537478

KEYWORDS: Reticles, Thermal modeling, Platinum, 3D modeling, Semiconducting wafers, Thermography, Glasses, Heat flux, Photomasks, Pellicles

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SPIE Journal Paper | 1 April 2004

Thermal response of optical reticles: experimental verification of finite element models

Amr Abdo, Roxann Engelstad, William Beckman, Edward Lovell

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1669489

KEYWORDS: Lamps, Reticles, Xenon, Mercury, Calibration, Thermography, Thermal modeling, Light sources, Copper, Floods

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SPIE Journal Paper | 1 January 2004

Microfluidic simulations for immersion lithography

Alexander Wei, Gregory Nellis, Amr Abdo, Roxann Engelstad, Cheng-Fu Chen, Michael Switkes, Mordechai Rothschild

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1632500

KEYWORDS: Semiconducting wafers, Liquids, Microfluidics, Immersion lithography, Capillaries, Computational fluid dynamics, Fluid dynamics, Computer simulations, Calcium, Refraction

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SPIE Journal Paper | 1 January 2004

Theoretical analysis of 157-nm hard pellicle system purification via a cyclic purge/fill process

Gregory Nellis, Amr Abdo, Roxann Engelstad, Eric Cotte

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1630313

KEYWORDS: Pellicles, Resistance, Oxygen, Nitrogen, Protactinium, Reticles, Finite element methods, Fluid dynamics, Optical lithography, Lithography

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Proceedings Article | 17 December 2003 Paper

Optimization of EUVL reticle thickness for image placement accuracy

Liang Zheng, Andrew Mikkelson, Amr Abdo, Roxann Engelstad, Edward Lovell, Thomas White

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518062

KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Device simulation, Mask making, Glasses, Metrology, Polishing, Solids

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Proceedings Article | 17 December 2003 Paper

Experimental investigation of hard pellicle purge processes

Amr Abdo, Gregory Nellis, Aya Diab, Eric Cotte, Aaron Chalekian, Roxann Engelstad, Edward Lovell, Chris Peski

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518125

KEYWORDS: Pellicles, Resistance, Reticles, Oxygen, Distortion, Mechanics, Optical lithography, Lithography, Nitrogen, Photography

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Proceedings Article | 26 June 2003 Paper

Preliminary microfluidic simulation for immersion lithography

Alexander Wei, Greg Nellis, Amr Abdo, Roxann Engelstad, Cheng-Fu Chen, Michael Switkes, Mordechai Rothschild

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.497495

KEYWORDS: Semiconducting wafers, Liquids, Immersion lithography, Computational fluid dynamics, Microfluidics, Fluid dynamics, Computer simulations, Water, Liquid lenses, Process modeling

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Proceedings Article | 1 July 2002 Paper

Numerical investigation of EUV mask contact layer defect printability at the 30-nm technology node

Amr Abdo, Pei-yang Yan

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472347

KEYWORDS: Photomasks, Carbon, Silicon, Silicon carbide, Oxides, Extreme ultraviolet lithography, Ruthenium, Semiconducting wafers, Extreme ultraviolet, 3D modeling

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Proceedings Article | 11 March 2002 Paper

Andrew Mikkelson, Amr Abdo, Eric Cotte, Jaewoong Sohn, Roxann Engelstad, Edward Lovell

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458256

KEYWORDS: Reticles, Pellicles, Electron beam lithography, Photomasks, Silica, Lithography, Device simulation, 3D modeling, Chromium, Mechanics

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Proceedings Article | 14 September 2001 Paper

Experimental model verification of the thermal response of optical reticles

Amr Abdo, Phillip Reu, Michael Schlax, Roxann Engelstad, William Beckman, John Mitchell, Edward Lovell

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435687

KEYWORDS: Reticles, Thermography, Calibration, Thermal modeling, Light sources, Copper, Optical lithography, Platinum, 3D modeling, Optical components

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