CONFERENCE PROCEEDINGS
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Armel Petit Mebiene Engohang
at STMicroelectronics
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Author
Publications (3)
Proceedings Article | 19 March 2015 Paper
Ready for multi-beam exposure at 5kV on MAPPER tool: lithographic and process integration performances of advanced resists/stack
Isabelle Servin, Ndeye Arame Thiam, Patricia Pimenta-Barros, Marie-Line Pourteau, Armel-Petit Mebiene, Julien Jussot, Jonathan Pradelles, Philippe Essomba, Ludovic Lattard, Pieter Brandt, Marco Wieland
Proceedings Volume 9423, 94231C (2015) https://doi.org/10.1117/12.2085915
KEYWORDS: Line width roughness, Lithography, Etching, Electron beam lithography, System on a chip, Metals, Scanning electron microscopy, Silicon, Resistance, Extreme ultraviolet
Proceedings Article | 8 October 2014 Paper
Assessment of carbon layer growth induced by resists outgassing in multi e-beams lithography
JC Marusic, ML Pourteau, S. Cêtre, L. Pain, AP Mebiene-Engohang, S. David, S. Labau, J. Boussey
Proceedings Volume 9235, 923520 (2014) https://doi.org/10.1117/12.2066152
KEYWORDS: Contamination, Semiconducting wafers, Carbon, Electron beam lithography, Scanning electron microscopy, Lithography, Wafer-level optics, Chemical species, Chemical analysis, Chemically amplified resists
Proceedings Article | 28 March 2014 Paper
Investigation of the resist outgassing and hydrocarbonaceous contamination induced in multi-electron-beam lithography tools
A.-P. Mebiene-Engohang, M. Pourteau, J. Marusic, L. Pain, T. Nakayama, A. Miyake, M. Smits, S. David, S. Labau, J. Boussey
Proceedings Volume 9049, 90492Q (2014) https://doi.org/10.1117/12.2046350
KEYWORDS: Contamination, Semiconducting wafers, Silicon, Thin film coatings, Scanning electron microscopy, Polymers, Carbon, Projection systems, Chemical species, Lithography
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