Multilayer defects cause severe reflectivity deformation and the degradation of through-focus imaging quality in Extreme ultraviolet (EUV) lithography. EUV mask repair techniques have primarily focused on the mask modification method to deal with the imaging contrast loss originating from multilayer defects. A multilayer defect compensation method based on three dimensional absorber correction considering through-focus imaging optimization and imaging contrast loss recovery is proposed in this paper. The proposed method compensates for the degradation of the imaging quality caused by multilayer defects with a certain defocus range by shifting the edge of the mask pattern and controlling the absorber thickness of the edge. The interactions between various absorber thicknesses and multilayer defect compensation are explored. Simulations verify that the through-focus imaging quality of the defective masks with bump defects could be obviously improved by the proposed method.
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