Dr. Gene E. Parris Profile

Dr. Gene E. Parris

at Air Products and Chemicals Inc

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Author

Publications (2)

Proceedings Article | 23 March 2007 Paper

Formulated surface conditioners in 50-nm immersion lithography: simultaneously reducing pattern collapse and line-width roughness

Minoru Sugiyama, Masakazu Sanada, Suping Wang, Patrick Wong, Stephan Sinkwitz, Manuel Jaramillo, Gene Parris

Proceedings Volume 6519, 651927 (2007) https://doi.org/10.1117/12.712188

KEYWORDS: Line width roughness, Electroluminescence, Semiconducting wafers, Lithography, Immersion lithography, Finite element methods, Photoresist processing, Scanners, Scanning electron microscopy, Optical lithography

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Proceedings Article | 12 May 2005 Paper

High refractive index immersion fluids for 193 nm immersion lithography

Bridgette Budhlall, Gene Parris, Peng Zhang, Xiaoping Gao, Zarka Zarkov, Brenda Ross, Simon Kaplan, John Burnett

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600025

KEYWORDS: Refractive index, Absorbance, Water, Photoresist materials, Immersion lithography, Absorption, Microfluidics, Ultraviolet radiation, Semiconducting wafers, Fluid dynamics

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