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Junsik Hong
at SAMSUNG Electronics Co Ltd
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Publications (1)
Proceedings Article | 10 April 2024 Poster
Low global warming C5F10O isomers for plasma atomic layer etching and reactive ion etching of SiO2 and Si3N4
Jihye Kim, Hojin Kang, Yongsun Cho, Junsik Hong, Heeyeop Chae
Proceedings Volume 12958, 129580S (2024) https://doi.org/10.1117/12.3014577
KEYWORDS: Atomic layer etching, Silica, Plasma, Plasma etching, Etching, Climate change, X-ray photoelectron spectroscopy, Windows, Plasma generation, Ions
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