Dr. Kanaiyalal C. Patel Profile

Dr. Kanaiyalal C. Patel

Process Engineer at HGST

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Author

Publications (4)

SPIE Journal Paper | 7 August 2012

Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography

Lei Wan, Ricardo Ruiz, He Gao, Kanaiyalal Patel, Jeffery Lille, Gabriel Zeltzer, Elizabeth Dobisz, Alexei Bogdanov, Thomas Albrecht, Paul Nealey

JM3, Vol. 11, Issue 3, 031405, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031405

KEYWORDS: Nanoimprint lithography, Chromium, Reactive ion etching, Lithography, Silicon, Double patterning technology, Electron beam lithography, Polymethylmethacrylate, Magnetism, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Line-frequency doubling of directed self-assembly patterns for single-digit bit pattern media lithography

K. Patel, R. Ruiz, J. Lille, L. Wan, E. Dobiz, H. Gao, N. Robertson, T. Albrecht

Proceedings Volume 8323, 83230U (2012) https://doi.org/10.1117/12.916589

KEYWORDS: Lithography, Double patterning technology, Etching, Chromium, Optical lithography, Silicon, Reactive ion etching, Plasma, Beam propagation method, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography

Lei Wan, Ricardo Ruiz, He Gao, Kanaiyalal Patel, Jeffery Lille, Gabriel Zeltzer, Elizabeth Dobisz, Alexei Bogdanov, Paul Nealey, Thomas Albrecht

Proceedings Volume 8323, 832319 (2012) https://doi.org/10.1117/12.916592

KEYWORDS: Reactive ion etching, Nanoimprint lithography, Chromium, Lithography, Electron beam lithography, Oxygen, Silicon, Magnetism, Double patterning technology, Directed self assembly

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Proceedings Article | 14 October 2011 Paper

Imprint lithography template technology for bit patterned media (BPM)

J. Lille, K. Patel, R. Ruiz, T.-W. Wu, H. Gao, Lei Wan, G. Zeltzer, E. Dobisz, T. Albrecht

Proceedings Volume 8166, 816626 (2011) https://doi.org/10.1117/12.898785

KEYWORDS: Beam propagation method, Etching, Magnetism, Lithography, Silicon, Head, Electron beam lithography, Oxides, Sensors, Scanning electron microscopy

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