Mr. Madhana Sunder Profile

Madhana Sunder

Adv. Engineer/Scientist-Dev at IBM Corp

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Author

Publications (3)

Proceedings Article | 23 March 2020 Presentation + Paper

Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance

Chris Robinson, Cody Murray, Luciana Meli, Anuja De Silva, Dario Goldfarb, Conor Thomas, Madhana Sunder, Mary Ann Zaitz, Guoda Lian, Yiping Yao, Leo Tai, Jay Bunt, Jim Rosa, Malik Ali, Steven Boettcher, Mark Stalter

Proceedings Volume 11323, 113230P (2020) https://doi.org/10.1117/12.2551612

KEYWORDS: Scanners, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Carbon, Contamination, Calibration, Sensors, Extreme ultraviolet

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SPIE Journal Paper | 23 May 2017

Development of TiO₂ containing hardmasks through plasma-enhanced atomic layer deposition

Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hoa Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy

JM3, Vol. 16, Issue 02, 023504, (May 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023504

KEYWORDS: Titanium dioxide, Metals, Atomic layer deposition, Optical lithography, Etching, Dry etching, Contamination, Modulation, Wet etching, Lithography

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Proceedings Article | 27 March 2017 Presentation + Paper

Development of TiO2 containing hardmasks through PEALD deposition

Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hao Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy

Proceedings Volume 10146, 1014615 (2017) https://doi.org/10.1117/12.2258380

KEYWORDS: Metals, Titanium, Lithography, Optical lithography, Dry etching, Etching, Photoresist materials, Titanium dioxide, Wet etching, Plasma, Carbon

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