Dr. Anuja De Silva
Technical Director at Lam Research
SPIE Involvement:
Membership & Communities Committee | Conference Program Committee | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author
Publications (53)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12954, 129540L (2024) https://doi.org/10.1117/12.3010127
KEYWORDS: SRAF, Printing, Semiconducting wafers, Optical proximity correction, Photoresist processing, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet

SPIE Journal Paper | 17 November 2023
JM3, Vol. 22, Issue 04, 044001, (November 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.044001
KEYWORDS: Line width roughness, Fourier transforms, Critical dimension metrology, Metrology, Signal to noise ratio, Film thickness, Extreme ultraviolet lithography, Scanning electron microscopy, Photoresist processing, Image analysis

Proceedings Article | 30 April 2023 Presentation
Hyo Seon Suh, Danilo De Simone, Christophe Beral, Mihir Gupta, Nadia Vandenbroeck, Anuja De Silva, Ali Haider, Ching-Chung Huang, Mohand Brouri, Francesco Gullo, Shruti Jambaldinni, Benjamin Kam, Hicham Zaid, Elisseos Verveniotis, Samantha Tan, Tim Weidman, Jengyi Yu, Da Li, Jun Xue, Younghee Lee
Proceedings Volume 12498, 1249803 (2023) https://doi.org/10.1117/12.2661652
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist processing, Materials processing, Interfaces

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 1249612 (2023) https://doi.org/10.1117/12.2658280
KEYWORDS: Fourier transforms, Signal to noise ratio, Bridges, Inspection, Printing, Metrology, Film thickness, Extreme ultraviolet lithography, Atomic force microscopy, Defect detection

SPIE Journal Paper | 13 December 2022 Open Access
JM3, Vol. 21, Issue 04, 041401, (December 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041401
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Photoresist developing, Industry, Extreme ultraviolet, Stochastic processes, Semiconductors, Metals, High volume manufacturing, Electron beam lithography

Showing 5 of 53 publications
Conference Committee Involvement (13)
Advances in Patterning Materials and Processes XLII
23 February 2025 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2024
30 September 2024 | Monterey, California, United States
Advances in Patterning Materials and Processes XLI
26 February 2024 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2023
2 October 2023 | Monterey, California, United States
Advances in Patterning Materials and Processes XL
27 February 2023 | San Jose, California, United States
Showing 5 of 13 Conference Committees
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