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Matthew Leuthold
at GLOBALFOUNDRIES Inc.
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Publications (1)
Proceedings Article | 16 October 2019 Presentation + Paper
Creating nonideality: enabling cross-platform process matching solutions with MPC (and a lot of hard work)
Charles Whiting, Ingo Bork, Peter Buck, Robin Chia, Bharadwaj Durvasula, Daniel Hill, Gazi Huda, Ken Jantzen, Matthew Leuthold, Jianliang Li, Joerg Mellmann, Kushlendra Mishra, Jed Rankin, Nageswara Rao, Malavika Sharma, Rachit Sharma, Adam Smith, Michaela Wentz
Proceedings Volume 11148, 1114805 (2019) https://doi.org/10.1117/12.2538347
KEYWORDS: Photomasks, Data modeling, Optical proximity correction, Critical dimension metrology, Calibration, Lithography, Semiconducting wafers, Manufacturing, Opacity, Etching
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