Mr. Mihir Upadhyaya Profile

Mihir Upadhyaya

Process Technology Development Engineer at Intel Corp.

SPIE Involvement:

Author

Area of Expertise:

EUV Lithography , Plasma Dry Etch

Publications (8)

SPIE Journal Paper | 15 May 2015 Open Access

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas Pistor, Gregory Denbeaux

JM3, Vol. 14, Issue 02, 023505, (May 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.2.023505

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Chemical species, Inspection, Computer simulations, Interfaces, Transmission electron microscopy, Modeling and simulation, Waveguides

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Proceedings Article | 16 March 2015 Paper

Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach

Proceedings Volume 9422, 94220Q (2015) https://doi.org/10.1117/12.2175842

KEYWORDS: Photomasks, Extreme ultraviolet, Multilayers, Chemical species, Extreme ultraviolet lithography, Inspection, Monte Carlo methods, Computer simulations, Waveguides, Transmission electron microscopy

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Proceedings Article | 17 April 2014 Paper

Investigating printability of native defects on EUV mask blanks through simulations and experiments

Mihir Upadhyaya, Vibhu Jindal, Henry Herbol, Il-Yong Jang, Hyuk Joo Kwon, Jenah Harris-Jones, Gregory Denbeaux

Proceedings Volume 9048, 90483L (2014) https://doi.org/10.1117/12.2057761

KEYWORDS: Finite-difference time-domain method, Photomasks, Chemical species, Transmission electron microscopy, Multilayers, Extreme ultraviolet lithography, Extreme ultraviolet, Monte Carlo methods, Atomic force microscopy, Inspection

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Proceedings Article | 1 April 2013 Paper

Optimizing XPS tool performance for characterizing trace contamination elements for EUV resist outgas testing

Mihir Upadhyaya, Yudhishthir Kandel, Gregory Denbeaux, Cecilia Montgomery, Yu-Jen Fan

Proceedings Volume 8679, 867934 (2013) https://doi.org/10.1117/12.2018629

KEYWORDS: Electrons, X-rays, Extreme ultraviolet lithography, Extreme ultraviolet, Contamination, Semiconducting wafers, Wafer-level optics, Gold, Reflectivity, Statistical analysis

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Proceedings Article | 1 April 2013 Paper

Resist outgassing contamination growth results using both photon and electron exposures

Gregory Denbeaux, Yudhishthir Kandel, Genevieve Kane, Diego Alvardo, Mihir Upadhyaya, Yashdeep Khopkar, Alexander Friz, Karen Petrillo, Jaewoong Sohn, Chandra Sarma, Dominic Ashworth

Proceedings Volume 8679, 86790L (2013) https://doi.org/10.1117/12.2011606

KEYWORDS: Contamination, Extreme ultraviolet lithography, Semiconducting wafers, Photoresist materials, Hydrogen, Scanners, Molecules, Plasma, Wafer-level optics, Electron beams

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Proceedings Article | 23 March 2012 Paper

A simulation study of cleaning induced EUV reflectivity loss mechanisms on mask blanks

Mihir Upadhyaya, Gregory Denbeaux, Arun John Kadaksham, Vibhu Jindal, Jenah Harris-Jones, Byunghoon Lee, Frank Goodwin

Proceedings Volume 8322, 832223 (2012) https://doi.org/10.1117/12.917972

KEYWORDS: Reflectivity, Extreme ultraviolet, Photomasks, Etching, Ruthenium, Multilayers, Surface roughness, Particles, Mask cleaning, Oxidation

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Proceedings Article | 23 March 2012 Paper

Developing particle detection test bench for vacuum components

Yashdeep Khopkar, Henry Herbol, Mihir Upadhyaya, Gregory Denbeaux, Vibhu Jindal, Patrick Kearney

Proceedings Volume 8322, 832225 (2012) https://doi.org/10.1117/12.919689

KEYWORDS: Particles, Optical proximity correction, Photomasks, Compound parabolic concentrators, Atmospheric particles, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Scanning electron microscopy, Detector development

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Proceedings Article | 8 April 2011 Paper

Dependence of contamination rates on key parameters in EUV optics

Yashdeep Khopkar, Petros Thomas, Leonid Yankulin, Rashi Garg, Chimaobi Mbanaso, Alin Antohe, Mihir Upadhyaya, Vimal Kumar Kamineni, Yu-Jen Fan, Gregory Denbeaux, Vibhu Jindal, Andrea Wüest, Eric Gullikson

Proceedings Volume 7969, 796923 (2011) https://doi.org/10.1117/12.879491

KEYWORDS: Contamination, Carbon, Extreme ultraviolet, Ruthenium, EUV optics, Polymers, Polymerization, Polymer thin films, Mirrors, Extreme ultraviolet lithography

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Showing 5 of 8 publications

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