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Min Zhong
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Publications (1)
Proceedings Article | 24 January 2013 Paper
Chemical mechanical planarization of amorphous Ge2Sb2Te5 using KClO4 as oxidizer in acidic slurry
Aodong He, Zhitang Song, Bo Liu, Min Zhong, Weili Liu, Liangyong Wang, Weixia Yan, Yu Lei, Guanping Wu
Proceedings Volume 8782, 87820Y (2013) https://doi.org/10.1117/12.2015253
KEYWORDS: Chemical mechanical planarization, Germanium, Antimony, Tellurium, Etching, Chemical elements, Resistance, Polishing, Corrosion, Temperature metrology
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