Mr. Ross Grynko Profile

Ross Grynko

at Onto Innovation Inc

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 10 April 2024 Presentation + Paper

Non-destructive measurement of bottom width in deep trench isolation structures using IRCD metrology

Nick Keller, Marc Poulingue, Ross Grynko, Troy Ribaudo, G. Andrew Antonelli, Victor Li, Marcello Ravasio, Delphine Le Cunff

Proceedings Volume 12955, 1295514 (2024) https://doi.org/10.1117/12.3010926

KEYWORDS: Simulations, Semiconducting wafers, Metrology, Nondestructive evaluation, Etching, Process control, Scatterometry

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Proceedings Article | 27 April 2023 Presentation + Paper

Measurement of W-recess profile in advanced node 3D NAND device with IRCD technology utilizing a specialized design-rule compliant target

Nick Keller, Zhuo Chen, Peter Wang, Rostislav Grynko, Troy Ribaudo, G. Andrew Antonelli, Youcheng Wang, Joshua Frederick, Sadao Takabayashi, John Hauck, Dan Engelhard

Proceedings Volume 12496, 124961Z (2023) https://doi.org/10.1117/12.2657719

KEYWORDS: Simulations, Metals, Finite-difference time-domain method, 3D acquisition, 3D metrology, Semiconducting wafers, Etching, Electric fields, Dielectrics, Plasmonics

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Proceedings Article | 22 February 2021 Presentation + Paper

Ellipsometric critical dimension metrology employing mid-infrared wavelengths for high-aspect-ratio channel hole module etch processes

G. Andrew Antonelli, Nick Keller, Troy Ribaudo, Franklin Wong, Wenmei Ming, Hepeng Ding, Zhuo Chen, Ross Grynko, Ahmad Fumani, Zhuan Liu, Sadao Takabayashi, John Hauck, Joshua Frederick, Dan Engelhard, Bo Hui Ng, Biow Hiem Ong, Luey Chwan Liong

Proceedings Volume 11611, 116111O (2021) https://doi.org/10.1117/12.2583786

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