Dr. Seth Kruger Profile

Dr. Seth Kruger

PhD Student at Univ at Albany

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Author

Publications (7)

Proceedings Article | 20 March 2012 Paper

Stable, fluorinated acid amplifiers for use in EUV lithography

Seth Kruger, Kenji Hosoi, Brian Cardineau, Koichi Miyauchi, Robert Brainard

Proceedings Volume 8325, 832514 (2012) https://doi.org/10.1117/12.917015

KEYWORDS: Amplifiers, Fluorine, Line edge roughness, Extreme ultraviolet lithography, Lithography, Polymers, Photoresist materials, Polymerization, Temperature metrology, Extreme ultraviolet

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Proceedings Article | 20 March 2012 Paper

Synthesis of stable acid amplifiers that produce strong highly-fluorinated polymer-bound acid

Kenji Hosoi, Brian Cardineau, William Earley, Seth Kruger, Koichi Miyauchi, Robert Brainard

Proceedings Volume 8325, 83251S (2012) https://doi.org/10.1117/12.917018

KEYWORDS: Polymers, Amplifiers, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Diffusion, Glasses, Molecules, Neck

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Proceedings Article | 8 April 2011 Paper

Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiation

Chimaobi Mbanaso, Seth Kruger, Craig Higgins, Yashdeep Khopkar, Alin Antohe, Brian Cardineau, Gregory Denbeaux

Proceedings Volume 7969, 79692J (2011) https://doi.org/10.1117/12.879507

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Polymers, Photoresist materials, Spectroscopy, Lithography, Polymer thin films, Diffusion, Surface conduction electron emitter displays, Ultraviolet radiation

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Proceedings Article | 1 April 2009 Paper

Lithographic evaluation and chemical modeling of acid amplifiers used in EUV photoresists

Robert Brainard, Craig Higgins, Seth Kruger, Srividya Revuru, Brian Cardineau, Sarah Gibbons, Dan Freedman, Harun Solak, Wang Yueh, Todd Younkin

Proceedings Volume 7273, 72733Q (2009) https://doi.org/10.1117/12.814308

KEYWORDS: Amplifiers, Line edge roughness, Lithography, Extreme ultraviolet lithography, Molecules, Oxygen, Thermal modeling, Thermodynamics, Photoresist materials, Polymers

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Proceedings Article | 15 April 2008 Paper

Options for high index fluids for third generation 193i lithography

Seth Kruger, Srividya Revuru, Shao-Zhong Zhang, Dimitri Vaughn, Eric Block, Paul Zimmerman, Robert Brainard

Proceedings Volume 6923, 69231O (2008) https://doi.org/10.1117/12.772994

KEYWORDS: Absorbance, Refractive index, Water, Sulfur, Oxygen, Refraction, Liquids, Argon, Potassium, Lithography

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Proceedings Article | 21 March 2008 Paper

Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation

Chimaobi Mbanaso, Gregory Denbeaux, Kim Dean, Robert Brainard, Seth Kruger, Elsayed Hassanein

Proceedings Volume 6921, 69213L (2008) https://doi.org/10.1117/12.772695

KEYWORDS: Extreme ultraviolet lithography, Absorption, Extreme ultraviolet, Photoresist materials, Lithography, Semiconducting wafers, Light, Absorbance, Image quality, Reflectivity

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Proceedings Article | 22 March 2007 Paper

Models for predicting the index of refraction of compounds at 193 and 589 nm

Robert Brainard, Seth Kruger, Eric Block

Proceedings Volume 6519, 651920 (2007) https://doi.org/10.1117/12.712431

KEYWORDS: Refraction, Molecules, Liquids, Chemical species, Water, Sodium, Excel, Lithography, Refractive index, Chemical analysis

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Showing 5 of 7 publications

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