Mr. Shingo Kanamitsu Profile

Shingo Kanamitsu

at KIOXIA Corp.

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 26 August 2024 Paper

Improvement of critical dimension uniformity using machine learning

Kunihiro Ugajin, Masato Naka, Shingo Kanamitsu

Proceedings Volume 13177, 131770W (2024) https://doi.org/10.1117/12.3033042

KEYWORDS: Photomasks, Data modeling, Machine learning, Performance modeling, Manufacturing, Decision trees

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Proceedings Article | 26 May 2022 Presentation + Paper

Design process integration enabling the productivity enhancement for nanoimprint lithography

Sachiko Kobayashi, Satoshi Mitsugi, Katsuyoshi Kodera, Kazuya Fukuhara, Anupam Mitra, Koki Ueha, Katsuya Abe, Motofumi Komori, Shingo Kanamitsu, Takuya Kono

Proceedings Volume 12052, 1205208 (2022) https://doi.org/10.1117/12.2614319

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Optical alignment, Optical lithography, Scanning electron microscopy, Ultraviolet radiation, Lithography, Scanning transmission electron microscopy

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Proceedings Article | 23 August 2021 Paper

Self-aligned double patterning process for sub-15nm nanoimprint template fabrication

Yoshinori Kagawa, Machiko Suenaga, Hikaru Sasaki, Koji Murano, Shunko Magoshi, Ryu Komatsu, Kosuke Takai, Mitsuru Kondo, Hideaki Sakurai, Shingo Kanamitsu

Proceedings Volume 11908, 119080D (2021) https://doi.org/10.1117/12.2603907

KEYWORDS: Forward error correction, Critical dimension metrology, Nanoimprint lithography, Double patterning technology, Lithography, Scanning electron microscopy, Nanolithography, Image processing, Semiconducting wafers, Etching

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Proceedings Article | 26 October 2020 Presentation + Paper

Resist pattern inspection for defect reduction in sub-15 nm templates

Takeharu Motokawa, Machiko Suenaga, Kazuki Hagihara, Noriko Iida nee Sakurai, Ryu Komatsu, Hideaki Sakurai, Shingo Kanamitsu, Keisuke Tsuda, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 11518, 115180H (2020) https://doi.org/10.1117/12.2572389

KEYWORDS: Inspection, Defect inspection, Scanning electron microscopy, Double patterning technology, Nanoimprint lithography, High volume manufacturing, Electron microscopes, Scatterometry, Microscopes, Coherence imaging

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