Dr. Shuang Xu Profile

Dr. Shuang Xu

at Wuhan Univ of Science and Technology

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 17 August 2023 Paper

Optical image encryption scheme based on random phase mask and phase shift digital holography

Yousheng Ke, Shuang Xu, Qing Tang

Proceedings Volume 12757, 127572U (2023) https://doi.org/10.1117/12.2690191

KEYWORDS: Image encryption, Holograms, Image processing, Optical image encryption, Digital holography, Phase shifts, 3D image reconstruction, Computer security, Image transmission, Image restoration

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Proceedings Article | 17 August 2023 Paper

Elliptical polarization characterization of scattered light in dark field defect inspection technology

Fengyou Wu, Shuang Xu, Chao Liu

Proceedings Volume 12757, 127570D (2023) https://doi.org/10.1117/12.2690184

KEYWORDS: Air contamination, Polarization, Particles, Scattered light, Light scattering, Semiconducting wafers, Polarized light, Signal to noise ratio, Incident light, Scattering

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Proceedings Article | 17 August 2023 Paper

Thick-mask optimization based on particle swarm optimization algorithm

Jinwei Pan, Shuang Xu, Xianhao Peng

Proceedings Volume 12757, 127570C (2023) https://doi.org/10.1117/12.2690171

KEYWORDS: Particle swarm optimization, Source mask optimization, Extreme ultraviolet lithography, Particles, Film thickness, 3D mask effects, Reflection, Detection and tracking algorithms, 3D modeling, Resolution enhancement technologies

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Proceedings Article | 1 August 2023 Paper

Fast mask optimization based on self-calibrated convolutions

Yichen Zhao, Shuang Xu, Jinwei Pan

Proceedings Volume 12747, 127470E (2023) https://doi.org/10.1117/12.2689153

KEYWORDS: Source mask optimization, Calibration, Convolution, Lithography, Mathematical optimization, Education and training, Imaging systems, Semiconducting wafers, Image processing, Optics manufacturing

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Proceedings Article | 1 August 2023 Paper

EUV photomask defect detection based on image segmentation

Xianhao Peng, Shuang Xu, Yichen Zhao

Proceedings Volume 12747, 127470Z (2023) https://doi.org/10.1117/12.2689144

KEYWORDS: Photomasks, Image segmentation, Extreme ultraviolet, Defect detection, Neural networks, Image processing, Printing, Machine learning, Feature fusion

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Proceedings Article | 1 August 2023 Paper

Compressed sensing imaging based on mixed blocking method

Weiyi Cao, Shuang Xu, Qing Tang, Zhiqiang Chen

Proceedings Volume 12747, 127471K (2023) https://doi.org/10.1117/12.2689138

KEYWORDS: Matrices, Image restoration, Image quality, Image processing, Compressed sensing, Signal processing, Reconstruction algorithms, Detection theory, Image compression, Sampling rates

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Proceedings Article | 14 October 2022 Paper

Mask optimization method based on residual network

Zainan Xiao, Shuang Xu, Zhiqiang Chen

Proceedings Volume 12343, 1234332 (2022) https://doi.org/10.1117/12.2649554

KEYWORDS: Photomasks, Lithography, Source mask optimization, Optics manufacturing, Semiconducting wafers, Optical proximity correction, Image processing, Convolution, Integrated optics, Imaging systems

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Proceedings Article | 20 December 2019 Paper

A novel 3D profile measurement method based on digital photoelastic technology

Guanjun Chen, Bo Tao, Gongfa Li, Shuang Xu, Fei Zeng

Proceedings Volume 11209, 112094O (2019) https://doi.org/10.1117/12.2549919

KEYWORDS: Photoelasticity, Fringe analysis, Digital photography, 3D image processing, Structured light, Phase shifts, Phase shifting

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Proceedings Article | 20 December 2019 Paper

Particle scattering field calculation and analysis based on Mie scattering theory

Cheng Liao, Shuang Xu, Zhenyuan Xia, Ruyi Ma

Proceedings Volume 11209, 112094N (2019) https://doi.org/10.1117/12.2549918

KEYWORDS: Light scattering, Particles, Scattering, Mie scattering, Semiconducting wafers, Polarization, Diffraction, Defect detection, Laser scattering, Rayleigh scattering

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Proceedings Article | 20 December 2019 Paper

Temperature compensation effect of different packaged FBGs under abrupt temperature changing environment

Li Xiong, Guozhang Jiang, Yongxing Guo, Shuang Xu, Yi Kuang

Proceedings Volume 11209, 112091D (2019) https://doi.org/10.1117/12.2544109

KEYWORDS: Fiber Bragg gratings, Sensors, Packaging, Adhesives, Prototyping, Environmental sensing, Optical design, Optical fibers

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Proceedings Article | 20 November 2019 Paper

Embedded fiber Bragg grating strain sensor with enhanced sensitivity

Li Xiong, Guozhang Jiang, Yongxing Guo, Shuang Xu

Proceedings Volume 11191, 1119114 (2019) https://doi.org/10.1117/12.2538084

KEYWORDS: Fiber Bragg gratings, Sensors, Capillaries, Civil engineering, Structural design, Structural health monitoring, Optical fibers, Resistance

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SPIE Journal Paper | 24 January 2019

Polarization aberration analysis in lithographic tools

Shuang Xu, Bo Tao, Yongxing Guo, Gongfa Li

OE, Vol. 58, Issue 08, 082405, (January 2019) https://doi.org/10.1117/12.10.1117/1.OE.58.8.082405

KEYWORDS: Polarization, Lithography, Imaging systems, Distortion, Nanoimprint lithography, Optical engineering, Photomasks, Lithographic illumination, Zernike polynomials, Semiconducting wafers

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Proceedings Article | 15 November 2018 Paper

Separation of variables based method for fast calculation of imaging system in lithographic tools

Shuang Xu, Bo Tao, Yongxing Guo, Gongfa Li

Proceedings Volume 10964, 1096446 (2018) https://doi.org/10.1117/12.2506071

KEYWORDS: Lithography, Imaging systems, Optical lithography, Photomasks, Optical proximity correction, Optical imaging, Image processing, Resolution enhancement technologies, Algorithm development, Computer simulations

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Proceedings Article | 7 November 2018 Paper

Polarization aberration measurement of lithographic tools

Shuang Xu, Gongfa Li, Bo Tao, Yongxing Guo

Proceedings Volume 10819, 1081909 (2018) https://doi.org/10.1117/12.2500778

KEYWORDS: Polarization, Lithography, Zernike polynomials, Distortion, Imaging systems, Data modeling, Manufacturing

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Proceedings Article | 12 January 2018 Paper

Image based method for aberration measurement of lithographic tools

Shuang Xu, Bo Tao, Yongxing Guo, Gongfa Li

Proceedings Volume 10620, 106200C (2018) https://doi.org/10.1117/12.2287057

KEYWORDS: Lithography, Imaging systems, Zernike polynomials, Distortion, Photomasks, Systems modeling, Wavefront aberrations, Reconstruction algorithms, Phase measurement, Image transmission

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Showing 5 of 15 publications

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