Dr. Shuling Wang Profile

Dr. Shuling Wang

at Siemens EDA

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 10 April 2024 Presentation

An integrated verification flow for curvilinear mask

Shuling Wang, Shumay Shang, Sagar Saxena, Xima Zhang, George Lippincott, Le Hong, John Sturtevant

Proceedings Volume 12954, 1295415 (2024) https://doi.org/10.1117/12.3010925

KEYWORDS: Optical proximity correction, Lithography

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Proceedings Article | 10 April 2024 Poster + Paper

Towards efficient and accurate cost functions for EUVL stochastic-aware OPC correction and verification: via failure probability versus image and process variation band metrics

Shuling Wang, Azat Latypov, Shumay Shang, Germain Fenger, Chih-I Wei, Xima Zhang

Proceedings Volume 12953, 1295319 (2024) https://doi.org/10.1117/12.3010912

KEYWORDS: Failure analysis, Stochastic processes, Monte Carlo methods, Optical proximity correction, Extreme ultraviolet lithography, Image processing, Photovoltaics, Photon transport, Light absorption, Industry

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Proceedings Article | 28 April 2023 Poster + Paper

EUV SRAFs printing modeling and verification in 2D hole array

Ling Ee Tan, Chih-I Wei, Lianghoon Yin, Azat Latypov, Shuling Wang, Satya Sriram, Prakash Deep, Farruh Shahidi, Shumay Shang, Germain Fenger, Le Hong, Werner Gillijns

Proceedings Volume 12494, 1249417 (2023) https://doi.org/10.1117/12.2658320

KEYWORDS: SRAF, Printing, Stochastic processes, Modeling, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet, Design and modelling, Data modeling, Photomasks

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Proceedings Article | 16 September 2022 Paper

EUV SRAFs printing modeling with bright field mask

Chih-I Wei, Azat Latypov, Shuling Wang, Satya Sriram, Prakash Deep, Yunfei Deng, Ethan Maguire, Shumay Shang, Germain Fenger, Werner Gillijns

Proceedings Volume 12325, 1232506 (2022) https://doi.org/10.1117/12.2640532

KEYWORDS: SRAF, Semiconducting wafers, Stochastic processes, Data modeling, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Calibration, Line width roughness

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Proceedings Article | 22 February 2021 Presentation + Paper

Gaussian random field EUV stochastic models, their generalizations and lithographically meaningful stochastic metrics

Azat Latypov, Gurdaman Khaira, Germain Fenger, Shuling Wang, Marko Chew, Shumay Shang

Proceedings Volume 11609, 1160917 (2021) https://doi.org/10.1117/12.2583792

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Proceedings Article | 20 February 2017 Paper

High-Q resonance near zero wave vector in photonic crystal slab for label-free sensing

Yonghao Liu, Shuling Wang, Weidong Zhou, Yuze Sun

Proceedings Volume 10108, 1010810 (2017) https://doi.org/10.1117/12.2251548

KEYWORDS: Photonic crystals, Silicon photonics, Biosensing, Optical sensing, Sensors, Integrated optics, Water, Signal to noise ratio, Polarization, Scanning electron microscopy, Polarizers

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Showing 5 of 6 publications

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