Dr. Germain L. Fenger
Director Product Management at Siemens EDA
SPIE Involvement:
Author
Area of Expertise:
Computational Lithography , OPC , DSA , EUVL
Publications (78)

Proceedings Article | 13 November 2024 Presentation
Yuansheng Ma, Haizhou Yin, Le Hong, Xuefeng Zeng, Xiaomei Li, Hongming Zhang, Jeongmi Lee, Xiaoyuan Qi, Neal Lafferty, Germain Fenger, George Lippincott, Jiechang Hou, Abdulrazaq Adams, Xima Zhang, Yuyang Sun, Danping Peng, Renyang Meng, Werner Gillijns
Proceedings Volume 13216, 132161V (2024) https://doi.org/10.1117/12.3034720
KEYWORDS: Etching, Machine learning, Metrology, Modeling, Semiconductor manufacturing, Data modeling, Contour extraction, Simulations, Scanning electron microscopy, Image processing

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13215, 1321507 (2024) https://doi.org/10.1117/12.3034957
KEYWORDS: Optical proximity correction, Design, Extreme ultraviolet lithography, Semiconducting wafers, Data modeling, Scanners

Proceedings Article | 18 September 2024 Paper
Proceedings Volume 13273, 132731M (2024) https://doi.org/10.1117/12.3031718
KEYWORDS: Source mask optimization, Metals, Printing, Nanoimprint lithography, Logic, Lithography, Extreme ultraviolet lithography, 3D mask effects, Extreme ultraviolet, Scanners

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 129530K (2024) https://doi.org/10.1117/12.3010519
KEYWORDS: Optical proximity correction, Semiconducting wafers, Extreme ultraviolet lithography, Modeling, Scanners, Reticles

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12953, 1295319 (2024) https://doi.org/10.1117/12.3010912
KEYWORDS: Failure analysis, Stochastic processes, Monte Carlo methods, Optical proximity correction, Extreme ultraviolet lithography, Image processing, Photovoltaics, Photon transport, Light absorption, Industry

Proceedings Article | 10 April 2024 Presentation
Shibing Wang, Yixiao Zhang, Jiechang Hou, Yuansheng Ma, Daman Khaira, Germain Fenger, Yuyang Sun, Bassem Hamieh, Boaz Alperson, Durairaj Baskaran, Md Rahman, Jerome Wandell, Youngjun Her
Proceedings Volume 12954, 129540W (2024) https://doi.org/10.1117/12.3010510
KEYWORDS: Directed self assembly, Stochastic processes, Optical lithography, Line edge roughness, Extreme ultraviolet, Atomic layer deposition, Semiconductors, Product engineering, Polymers, Personal protective equipment

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12954, 129540L (2024) https://doi.org/10.1117/12.3010127
KEYWORDS: SRAF, Printing, Semiconducting wafers, Optical proximity correction, Photoresist processing, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 1295516 (2024) https://doi.org/10.1117/12.3010898
KEYWORDS: Optical proximity correction, Metrology, Modeling, Extreme ultraviolet, Scanning electron microscopy, Shrinkage, Contour extraction, Signal to noise ratio, EUV optics

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12957, 129571D (2024) https://doi.org/10.1117/12.3011090
KEYWORDS: Stochastic processes, Extreme ultraviolet lithography, Covariance, Failure analysis, Monte Carlo methods, Statistical analysis, Principal component analysis, Photoresist processing, 3D modeling, Extreme ultraviolet

Proceedings Article | 22 November 2023 Presentation
Proceedings Volume PC12751, PC127510Q (2023) https://doi.org/10.1117/12.2687822
KEYWORDS: Optical proximity correction, Photomasks, Extreme ultraviolet, Calibration, Semiconducting wafers, Scanning electron microscopy, Printing, Modeling, Machine learning, Data modeling

SPIE Journal Paper | 19 October 2023
JM3, Vol. 22, Issue 04, 041603, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041603
KEYWORDS: Modeling, Data modeling, Semiconducting wafers, Optical proximity correction, Contour modeling, Metrology, Calibration, Stochastic processes, Scanning electron microscopy, Performance modeling

Proceedings Article | 5 October 2023 Paper
Proceedings Volume 12802, 1280208 (2023) https://doi.org/10.1117/12.2680884
KEYWORDS: Contour extraction, Scanning electron microscopy, Image quality, Deep learning, Denoising, Image processing, Data modeling, Image denoising, Defect detection

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 124950A (2023) https://doi.org/10.1117/12.2660413
KEYWORDS: Photomasks, Extreme ultraviolet, Source mask optimization, Resolution enhancement technologies, Optical proximity correction, Lithography, Optical lithography, Capacitors, Semiconducting wafers, SRAF

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12495, 124950S (2023) https://doi.org/10.1117/12.2660763
KEYWORDS: Optical lithography, Extreme ultraviolet, Optical proximity correction, Design and modelling, SRAF, Semiconducting wafers, Inspection, Source mask optimization, Printing, Electronic design automation

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940J (2023) https://doi.org/10.1117/12.2658260
KEYWORDS: Optical proximity correction, Stochastic processes, Semiconducting wafers, Modeling, Simulations, Design and modelling, Extreme ultraviolet lithography, Calibration, Logic, Lithography

Proceedings Article | 28 April 2023 Poster + Paper
Proceedings Volume 12494, 1249417 (2023) https://doi.org/10.1117/12.2658320
KEYWORDS: SRAF, Printing, Stochastic processes, Modeling, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet, Design and modelling, Data modeling, Photomasks

Proceedings Article | 28 April 2023 Poster + Paper
Proceedings Volume 12494, 1249419 (2023) https://doi.org/10.1117/12.2658651
KEYWORDS: Failure analysis, Stochastic processes, Monte Carlo methods, Extreme ultraviolet lithography, Extreme ultraviolet, Statistical analysis, Optical proximity correction, Error analysis

Proceedings Article | 1 December 2022 Poster + Paper
Proceedings Volume 12292, 122920W (2022) https://doi.org/10.1117/12.2645953
KEYWORDS: Photomasks, Optical proximity correction, Stochastic processes, Extreme ultraviolet, Semiconducting wafers, Wafer-level optics, Source mask optimization, Manufacturing, Inspection, Signal to noise ratio, Defect inspection

Proceedings Article | 31 October 2022 Poster
Proceedings Volume PC12292, PC122920Z (2022) https://doi.org/10.1117/12.2645403
KEYWORDS: Scanning electron microscopy, Semiconductors, Data modeling, Photomasks, Metrology, Calibration, Wafer-level optics, Stochastic processes, Shape analysis, Semiconducting wafers

Proceedings Article | 16 September 2022 Paper
Proceedings Volume 12325, 1232506 (2022) https://doi.org/10.1117/12.2640532
KEYWORDS: SRAF, Semiconducting wafers, Stochastic processes, Data modeling, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Calibration, Line width roughness

Proceedings Article | 13 June 2022 Presentation + Paper
Proceedings Volume 12052, 120520Q (2022) https://doi.org/10.1117/12.2614118
KEYWORDS: Optimization (mathematics), Calibration, Data modeling, Optical proximity correction, Binary data, Performance modeling, Genetic algorithms, Process modeling, Computer simulations, Precision calibration

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12056, PC1205605 (2022) https://doi.org/10.1117/12.2614280
KEYWORDS: Etching, Reactive ion etching, Optical proximity correction, Neural networks, Machine learning, Ions

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12053, 120530Z (2022) https://doi.org/10.1117/12.2615955
KEYWORDS: Semiconducting wafers, Error analysis, Metrology, Scanners, Data modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Wavefronts, Modulation, Wavefront aberrations

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12051, 1205105 (2022) https://doi.org/10.1117/12.2614142
KEYWORDS: Stochastic processes, Line edge roughness, Calibration, Line width roughness, Extreme ultraviolet, Statistical analysis, Diffusion, Photoresist processing, Monte Carlo methods, Extreme ultraviolet lithography

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12055, 1205503 (2022) https://doi.org/10.1117/12.2615644
KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Optical lithography, Double patterning technology

Proceedings Article | 12 October 2021 Presentation + Paper
Proceedings Volume 11854, 1185411 (2021) https://doi.org/10.1117/12.2600945
KEYWORDS: Scanning electron microscopy, Denoising, Machine learning, Bridges, Metrology, Stochastic processes, Image processing, Neural networks, Detection and tracking algorithms, Optical proximity correction

Proceedings Article | 12 October 2021 Presentation + Paper
Proceedings Volume 11855, 118550E (2021) https://doi.org/10.1117/12.2601674
KEYWORDS: Photomasks, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Feature extraction, Critical dimension metrology, Metrology, OLE for process control, Image quality, Image processing

Proceedings Article | 22 February 2021 Paper
Proceedings Volume 11613, 116130H (2021) https://doi.org/10.1117/12.2584771
KEYWORDS: SRAF, 3D modeling, Printing, Data modeling, 3D printing

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 1161112 (2021) https://doi.org/10.1117/12.2583837
KEYWORDS: Optical proximity correction, Electron beam lithography, 3D modeling, Inspection, Calibration, Lithography, Data modeling, Time metrology, Semiconducting wafers, Scanning electron microscopy

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 1161113 (2021) https://doi.org/10.1117/12.2591300
KEYWORDS: Process modeling, Semiconductor manufacturing, Control systems, Statistical analysis, Scanning electron microscopy, Process control, Calibration

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11609, 1160917 (2021) https://doi.org/10.1117/12.2583792

Proceedings Article | 23 March 2020 Presentation + Paper
Lilian Neim, Bruce Smith, Germain Fenger
Proceedings Volume 11323, 1132314 (2020) https://doi.org/10.1117/12.2553232
KEYWORDS: Polarization, Photomasks, Extreme ultraviolet, Diffraction, Ruthenium, Tantalum, Extreme ultraviolet lithography, Nickel, Reflectivity, Refractive index

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11323, 113230L (2020) https://doi.org/10.1117/12.2551965
KEYWORDS: Stochastic processes, Extreme ultraviolet lithography, Photons, Photoresist processing, Failure analysis, Extreme ultraviolet, Calibration, Statistical analysis, Data modeling, Semiconducting wafers

Proceedings Article | 23 March 2020 Presentation + Paper
Yuansheng Ma, Le Hong, James Word, Fan Jiang, Vlad Liubich, Liang Cao, Srividya Jayaram, Doohwan Kwak, YoungChang Kim, Germain Fenger, Ananthan Raghunathan, Joerg Mellmann
Proceedings Volume 11329, 1132909 (2020) https://doi.org/10.1117/12.2551703
KEYWORDS: Machine learning, Optical proximity correction, Photomasks, Etching, Data modeling, Process modeling, Neural networks, Semiconducting wafers, Inspection

Proceedings Article | 20 March 2020 Presentation + Paper
Proceedings Volume 11325, 1132524 (2020) https://doi.org/10.1117/12.2554527
KEYWORDS: Scanning electron microscopy, Data modeling, Calibration, Optical proximity correction, Semiconducting wafers, Metrology, Image processing, 3D modeling, Photomasks, Image quality

Proceedings Article | 26 September 2019 Paper
Proceedings Volume 11148, 111481B (2019) https://doi.org/10.1117/12.2536892
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Source mask optimization, Nanoimprint lithography, SRAF, Optical proximity correction, Phase shifting, Logic

Proceedings Article | 4 April 2019 Paper
Kostas Adam, Shashidhara Ganjugunte, Clement Moyroud, Kostya Shchehlik, Michael Lam, Andrew Burbine, Germain Fenger, Yuri Granik
Proceedings Volume 10962, 109620F (2019) https://doi.org/10.1117/12.2519848
KEYWORDS: Neural networks, Machine learning, Systems modeling, Optical proximity correction, Data modeling, Process modeling, Calibration, Lithography, Cadmium, Coastal modeling

Proceedings Article | 21 March 2019 Paper
Proceedings Volume 10962, 109620V (2019) https://doi.org/10.1117/12.2517051
KEYWORDS: Manufacturing, Optical proximity correction, Extreme ultraviolet, Metals, Photomasks, Visualization, Scanning electron microscopy, Printing, Metrology, Optical lithography

Proceedings Article | 20 March 2019 Presentation + Paper
Proceedings Volume 10961, 1096106 (2019) https://doi.org/10.1117/12.2515271
KEYWORDS: Etching, Optical proximity correction, Mahalanobis distance, Machine learning, Convolution, Statistical modeling, Metals, Calibration, Optical lithography, Lithography

Proceedings Article | 18 March 2019 Presentation
Proceedings Volume 10961, 109610E (2019) https://doi.org/10.1117/12.2515128
KEYWORDS: Photoresist developing, Lithography, Finite element methods, Process modeling, Photoresist processing, Computer simulations, Chemically amplified resists, Optical lithography, Photoresist materials, 3D modeling

Proceedings Article | 2 January 2019 Presentation + Paper
Proceedings Volume 10809, 108090G (2019) https://doi.org/10.1117/12.2502809
KEYWORDS: Photomasks, Extreme ultraviolet, Source mask optimization, Resolution enhancement technologies, Tantalum, SRAF, Lithography, Logic, Image enhancement, Image processing

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830P (2018) https://doi.org/10.1117/12.2299668
KEYWORDS: Optical proximity correction, Photomasks, SRAF, Extreme ultraviolet, Image quality, Extreme ultraviolet lithography, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 19 March 2018 Presentation + Paper
Lianghong Yin, Ananthan Raghunathan, Germain Fenger, Shumay Shang, Neal Lafferty, John Sturtevant
Proceedings Volume 10583, 105830Q (2018) https://doi.org/10.1117/12.2299872
KEYWORDS: Metals, Optical proximity correction, Scanners, Extreme ultraviolet lithography, Manufacturing, Overlay metrology, Bridges, Optical lithography, Logic, Photomasks

Proceedings Article | 16 October 2017 Paper
Proceedings Volume 10450, 104500V (2017) https://doi.org/10.1117/12.2280548
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Finite-difference time-domain method, Wafer-level optics, Systems modeling, Extreme ultraviolet lithography, Projection systems, Scanners, Electromagnetism

Proceedings Article | 16 October 2017 Paper
Proceedings Volume 10451, 104510W (2017) https://doi.org/10.1117/12.2280609
KEYWORDS: Optical proximity correction, Wavefronts, Extreme ultraviolet, Scanners, Photomasks, Error analysis, Extreme ultraviolet lithography, Manufacturing, 3D modeling, Tolerancing

SPIE Journal Paper | 19 August 2017
JM3, Vol. 16, Issue 04, 041004, (August 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041004
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Wafer-level optics, Finite-difference time-domain method, Extreme ultraviolet, Systems modeling, Scanners, Extreme ultraviolet lithography, Projection systems

SPIE Journal Paper | 25 July 2017
JM3, Vol. 16, Issue 03, 033502, (July 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033502

Proceedings Article | 30 March 2017 Presentation + Paper
Proceedings Volume 10148, 101480B (2017) https://doi.org/10.1117/12.2258056
KEYWORDS: Optical lithography, Optical proximity correction, Directed self assembly, Resolution enhancement technologies, Etching, Monte Carlo methods, Photomasks, Manufacturing, Metals, Logic, Visualization, Error analysis, Solids

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10143, 1014316 (2017) https://doi.org/10.1117/12.2261222
KEYWORDS: Optical proximity correction, Physics, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Optical simulations, Apodization, Optical aberrations, Wavefront aberrations, Photovoltaics, Computer simulations, Reticles, Scanners, Lithography

Proceedings Article | 21 March 2017 Presentation + Paper
J. Andres Torres, Germain Fenger, Daman Khaira, Yuansheng Ma, Yuri Granik, Chris Kapral, Joydeep Mitra, Polina Krasnova, Dehia Ait-Ferhat
Proceedings Volume 10144, 101440E (2017) https://doi.org/10.1117/12.2264178
KEYWORDS: Electronic design automation, Photomasks, Polymers, Optical lithography, Design for manufacturing, Lithography, Epitaxy, Inspection, Directed self assembly, Manufacturing, Systems modeling, Visualization, Data modeling

Proceedings Article | 20 October 2016 Paper
Proceedings Volume 10032, 100320N (2016) https://doi.org/10.1117/12.2249680
KEYWORDS: Optical proximity correction, Semiconducting wafers, Data modeling, Refractive index, Calibration, Statistical modeling, Photomasks, Process modeling, Lithography, Monte Carlo methods

SPIE Journal Paper | 29 September 2016
JM3, Vol. 15, Issue 03, 031610, (September 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.031610
KEYWORDS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction

Proceedings Article | 22 March 2016 Paper
Proceedings Volume 9777, 97770N (2016) https://doi.org/10.1117/12.2219505
KEYWORDS: Optical lithography, Semiconducting wafers, Lithography, Directed self assembly, Immersion lithography, Extreme ultraviolet, Optical resolution, Neck, Modulation, Photomasks, Lens design, Ions, Neodymium, Visualization, Code division multiplexing

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97762M (2016) https://doi.org/10.1117/12.2219704
KEYWORDS: Extreme ultraviolet lithography, Metrology, Image processing, Extreme ultraviolet, Software development, Photomicroscopy, Photomasks, Lithography, Wavefronts, Image analysis, Image filtering, Monochromatic aberrations, Principal component analysis, Data modeling, Computer simulations

SPIE Journal Paper | 11 September 2015
JM3, Vol. 14, Issue 03, 031216, (September 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031216
KEYWORDS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly

Proceedings Article | 9 July 2015 Paper
Proceedings Volume 9658, 965804 (2015) https://doi.org/10.1117/12.2196524
KEYWORDS: Optical lithography, Photomasks, Logic, Etching, Calibration, Data modeling, Scanning electron microscopy, Double patterning technology, Lithography, Directed self assembly

Proceedings Article | 27 March 2015 Paper
Proceedings Volume 9423, 94232A (2015) https://doi.org/10.1117/12.2085985
KEYWORDS: Convolution, Scanning electron microscopy, Annealing, Transmission electron microscopy, Binary data, Optical lithography, Lithography, Polymers, Neodymium, Directed self assembly

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9423, 942306 (2015) https://doi.org/10.1117/12.2085850
KEYWORDS: Photomasks, Optical proximity correction, Printing, Source mask optimization, Optical lithography, Neodymium, Visualization, Transmission electron microscopy, Dysprosium, Directed self assembly

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9423, 942305 (2015) https://doi.org/10.1117/12.2086090
KEYWORDS: Optical lithography, Photomasks, Etching, Polymethylmethacrylate, Lithography, Double patterning technology, Scanning electron microscopy, Picosecond phenomena, Metals, Directed self assembly

Proceedings Article | 17 October 2014 Paper
Proceedings Volume 9231, 92310Q (2014) https://doi.org/10.1117/12.2065840
KEYWORDS: Data modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Calibration, Neodymium, Mask making, Tolerancing, Directed self assembly

Proceedings Article | 17 October 2014 Paper
Proceedings Volume 9231, 92310T (2014) https://doi.org/10.1117/12.2065508
KEYWORDS: Optical lithography, Photomasks, Metals, Modulation, Lithography, Optical proximity correction, Monte Carlo methods, Printing, Phase shift keying, Directed self assembly

Proceedings Article | 8 October 2014 Paper
Proceedings Volume 9235, 92351X (2014) https://doi.org/10.1117/12.2069188
KEYWORDS: Data modeling, Calibration, Photomasks, Monte Carlo methods, Double patterning technology, Ions, Cements, Metrology, Neodymium, Directed self assembly

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90480T (2014) https://doi.org/10.1117/12.2046203
KEYWORDS: Optical proximity correction, Extreme ultraviolet, Reflectivity, Photomasks, Reticles, Deep ultraviolet, Extreme ultraviolet lithography, Neodymium, Etching, Electroluminescent displays

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90482M (2014) https://doi.org/10.1117/12.2046483
KEYWORDS: Metrology, Monochromatic aberrations, Wavefronts, Extreme ultraviolet lithography, Nanoimprint lithography, Diffraction, Lithography, Detection and tracking algorithms, Photomasks, Extreme ultraviolet

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90480V (2014) https://doi.org/10.1117/12.2046096
KEYWORDS: Personal protective equipment, Photomasks, Semiconducting wafers, Optical proximity correction, Wafer-level optics, Extreme ultraviolet lithography, Cadmium, Logic, Metrology, Near field optics

Proceedings Article | 28 March 2014 Paper
Proceedings Volume 9053, 90530R (2014) https://doi.org/10.1117/12.2045328
KEYWORDS: Monte Carlo methods, Manufacturing, Lithography, Metals, Photomasks, Optical lithography, Directed self assembly, Visualization, Polymers, Design for manufacturability

SPIE Journal Paper | 2 October 2013
JM3, Vol. 12, Issue 04, 043001, (October 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.043001
KEYWORDS: Monochromatic aberrations, Extreme ultraviolet lithography, Metrology, Wavefronts, Diffraction, Data modeling, Semiconducting wafers, Error analysis, Lithography, Zernike polynomials

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86790P (2013) https://doi.org/10.1117/12.2010132
KEYWORDS: Monochromatic aberrations, Extreme ultraviolet lithography, Critical dimension metrology, Lithography, Semiconducting wafers, Binary data, Data modeling, Wavefronts, Spherical lenses, Metrology

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86790V (2013) https://doi.org/10.1117/12.2009281
KEYWORDS: Optical proximity correction, Photomasks, Extreme ultraviolet, Calibration, Extreme ultraviolet lithography, Deep ultraviolet, Lithography, Metrology, Data modeling, Semiconducting wafers

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 867918 (2013) https://doi.org/10.1117/12.2011643
KEYWORDS: 3D modeling, Photomasks, Optical proximity correction, Extreme ultraviolet, Extreme ultraviolet lithography, Systems modeling, Scanners, Reflectivity, Lithography, Semiconducting wafers

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79731B (2011) https://doi.org/10.1117/12.879058
KEYWORDS: Finite element methods, Monochromatic aberrations, Photomasks, Source mask optimization, Diffraction, Wavefronts, Lithography, Spherical lenses, Semiconductors, Binary data

SPIE Journal Paper | 1 January 2011
Daisuke Hibino, Hiroyuki Shindo, Yuichi Abe, Yutaka Hojyo, Germain Fenger, Thuy Do, Ir Kusnadi, John Sturtevant, Jeroen Van de Kerkhove, Peter De Bisschop
JM3, Vol. 10, Issue 1, 013012, (January 2011) https://doi.org/10.1117/12.10.1117/1.3530082
KEYWORDS: Scanning electron microscopy, Optical proximity correction, Calibration, Image quality, Electron microscopes, Lithography, Semiconducting wafers, Critical dimension metrology, Optical alignment, Visualization

SPIE Journal Paper | 1 November 2010
JM3, Vol. 9, Issue 04, 043001, (November 2010) https://doi.org/10.1117/12.10.1117/1.3496030
KEYWORDS: Data modeling, Calibration, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Optical proximity correction, Extreme ultraviolet, Critical dimension metrology, Reticles, Modulation

Proceedings Article | 2 April 2010 Paper
Daisuke Hibino, Hiroyuki Shindo, Yuichi Abe, Yutaka Hojyo, Germain Fenger, Thuy Do, Ir Kusnadi, John Sturtevant, Peter De Bisschop, Jeroen Van de Kerkhove
Proceedings Volume 7638, 76381X (2010) https://doi.org/10.1117/12.846025
KEYWORDS: Scanning electron microscopy, Optical proximity correction, Calibration, Image quality, Lithography, Semiconducting wafers, Visualization, Edge detection, Image acquisition, Alignment procedures

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 763615 (2010) https://doi.org/10.1117/12.846966
KEYWORDS: Calibration, Data modeling, Photomasks, Semiconducting wafers, Optical proximity correction, Extreme ultraviolet, Extreme ultraviolet lithography, Electronic design automation, Modulation, Critical dimension metrology

SPIE Journal Paper | 1 October 2009
JM3, Vol. 8, Issue 04, 041505, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238515
KEYWORDS: Metrology, Fractal analysis, Point spread functions, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Calibration, Scanning electron microscopy, Visualization, Convolution

Proceedings Article | 13 March 2009 Paper
Proceedings Volume 7275, 72751F (2009) https://doi.org/10.1117/12.814430
KEYWORDS: Calibration, Optical proximity correction, Scanning electron microscopy, Line edge roughness, Edge detection, Algorithm development, Optical alignment, Semiconducting wafers, Data modeling, Critical dimension metrology

Proceedings Article | 13 March 2009 Paper
Proceedings Volume 7275, 72750X (2009) https://doi.org/10.1117/12.813753
KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Printing, Lithography, Source mask optimization, Electroluminescence, Manufacturing, Optical lithography, Reticles

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