Dr. Boaz Ophir Profile

Dr. Boaz Ophir

at KLA Israel

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 27 April 2023 Presentation + Paper

Machine learning robustness in overlay metrology

Udi Shusterman, Grechin Sveta, Boaz Ophir, Cindy Kato, Masanobu Hayashi, Shengxun Zhao, Jiehong Ng, Tomohiro Goto, Atsushi Imada, Manabu Miyake, Yasuki Takeuchi, Hiroyuki Mizuochi

Proceedings Volume 12496, 124960M (2023) https://doi.org/10.1117/12.2657438

KEYWORDS: Semiconducting wafers, Education and training, Data modeling, High volume manufacturing, Overlay metrology, Machine learning, 3D modeling, Metrology, Performance modeling, Object detection

Read Abstract +

Proceedings Article | 22 February 2021 Presentation + Paper

Machine learning for Tool Induced Shift (TIS) reduction: an HVM case study

Boaz Ophir, Udi Shusterman, Anna Golotsvan, Cindy Kato, Masanobu Hayashi, Richika Kato, Tomohiro Goto, Taketo Kuriyama, Manabu Miyake, Yasuki Takeuchi, Hiroyuki Mizuochi

Proceedings Volume 11611, 116110E (2021) https://doi.org/10.1117/12.2590247

Read Abstract +

Proceedings Article | 20 March 2020 Presentation + Paper

Optical overlay measurement accuracy improvement with machine learning

Alexander Verner, Hyunsok Kim, Ikhyun Jeong, Seungwoo Koo, Dongjin Lee, Honggoo Lee, Boaz Ophir, Ohad Bachar, Liran Yerushalmi, Sanghuck Jeon, Dongsub Choi, Jeongpyo Lee

Proceedings Volume 11325, 113251Z (2020) https://doi.org/10.1117/12.2551850

KEYWORDS: Detection and tracking algorithms, Semiconducting wafers, Overlay metrology, Scanning electron microscopy, Optical parametric oscillators, Data modeling, Machine learning, Optical testing, Feature extraction, Metrology

Read Abstract +

Proceedings Article | 20 March 2020 Paper

Machine learning for Tool Induced Shift (TIS) reduction

Shlomit Katz, Boaz Ophir, Udi Shusterman, Anna Golotsvan, Liran Yerushalmi, Efi Megged, Yoav Grauer, Jian Zhang, Alimei Shih, Shi-Ming Wei, Judith Yep, Fiona (Shuk Fan) Leung, Pek Beng Ong

Proceedings Volume 11325, 113252C (2020) https://doi.org/10.1117/12.2550747

KEYWORDS: Semiconducting wafers, Overlay metrology, Machine learning, Metrology, Data modeling, 3D modeling, Performance modeling

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years