Dezheng Sun
at ASML
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 28 April 2023 Paper
Rongkuo Zhao, Fan Zhou, Jialei Tang, Jeff Lu, Yunbo Liu, Dezheng Sun, Ming-Chun Tien, Stephen Hsu, Rachit Gupta, Youping Zhang, Joerg Zimmermann
Proceedings Volume 12495, 124950R (2023) https://doi.org/10.1117/12.2660858
KEYWORDS: Source mask optimization, SRAF, Light sources and illumination, Extreme ultraviolet, 3D mask effects, Image quality, Computational lithography

Proceedings Article | 28 April 2023 Presentation + Paper
Austin Peng, Christopher Kaplan, Jeff Lu, Michael Crouse, Zuanyi Li, Xiaobo Xie, David Rio, Achim Woessner, Alexander Tan, Cuiping Zhang, Xiaoyang Li, Dezheng Sun, Stephen Hsu, Rafael Howell, Joerg Zimmermann
Proceedings Volume 12494, 124940C (2023) https://doi.org/10.1117/12.2657454
KEYWORDS: Source mask optimization, Computational lithography, Nanoimprint lithography, Extreme ultraviolet, Semiconducting wafers, Scanners, Modeling, Reticles, Artificial intelligence, Light sources and illumination

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940Q (2023) https://doi.org/10.1117/12.2658511
KEYWORDS: Photomasks, Optical proximity correction, Reflection, Critical dimension metrology, Tantalum, Reflectivity, Metrology, Semiconducting wafers, Scanners, Reticles

Proceedings Article | 31 October 2022 Poster
Natalia Davydova, Vincent Wiaux, Joost Bekaert, Frank Timmermans, Bram Slachter, Tatiana Kovalevich, Eelco van Setten, Marcel Beckers, Simon van Gorp, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Hoon Ser, Diederik de Bruin, Stephen Hsu, Rene Carpaij
Proceedings Volume PC12292, PC1229210 (2022) https://doi.org/10.1117/12.2653388
KEYWORDS: Tantalum, Image resolution, Source mask optimization, Scanners, Reflectivity, Optical proximity correction, Manufacturing, Extreme ultraviolet lithography, Control systems

Proceedings Article | 26 February 2021 Presentation
Will Conley, Vince Vince Plachecki, Stephen Hsu, Michael Crouse, Rongkuo Zhao, John He, Pieter Scheijgrond, Dezheng Sun, Xiaoyang Li, Dongqing Zhang, Ming-Chun Tien, Jun Ye, Rafael Howell, Chen Liu, Xiaolong Zhang, Hai Li, Zuanyi Li, Xiaobo Xie, Jing Su, Yzzer Roman
Proceedings Volume 11613, 116130E (2021) https://doi.org/10.1117/12.2585651

Proceedings Article | 20 March 2018 Presentation + Paper
Shibing Wang, Stanislas Baron, Nishrin Kachwala, Chidam Kallingal, Dezheng Sun, Vincent Shu, Weichun Fong, Zero Li, Ahmad Elsaid, Jin-Wei Gao, Jing Su, Jung-Hoon Ser, Quan Zhang, Been-Der Chen, Rafael Howell, Stephen Hsu, Larry Luo, Yi Zou, Gary Zhang, Yen-Wen Lu, Yu Cao
Proceedings Volume 10587, 105870N (2018) https://doi.org/10.1117/12.2299421
KEYWORDS: SRAF, Machine learning, Optical proximity correction, Photomasks, Lithography, Model-based design, Source mask optimization, Computational lithography, Image processing

Proceedings Article | 16 October 2017 Presentation + Paper
Shibing Wang, Jing Su, Quan Zhang, Weichun Fong, Dezheng Sun, Stanislas Baron, Cuiping Zhang, Chenxi Lin, Been-Der Chen, Rafael Howell, Stephen Hsu, Larry Luo, Yi Zou, Yen-Wen Lu, Yu Cao
Proceedings Volume 10451, 104510D (2017) https://doi.org/10.1117/12.2283493
KEYWORDS: SRAF, Machine learning, Lithography, Photomasks, Optical proximity correction, Model-based design, Computational lithography, Data modeling, Image processing

Showing 5 of 7 publications
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