Dr. Frank J. Timmermans
Architect at ASML Netherlands BV
SPIE Involvement:
Author
Publications (19)

SPIE Journal Paper | 30 January 2025
JM3, Vol. 24, Issue 01, 011012, (January 2025) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011012
KEYWORDS: Optical proximity correction, Critical dimension metrology, Reflectivity, Extreme ultraviolet, Design, Light sources and illumination, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Reflection

Proceedings Article | 12 November 2024 Presentation + Paper
Laura Huddleston, Rick Jansen, Emilio Bajonero Canonico, Ali Mohammadkhah, Carlos Duran, Michael Campion, Roni Levi, Yohei Ikebe, Takahiro Onoue, Bryan Kasprowicz, Frank Timmermans, Justin Rademaker
Proceedings Volume 13215, 132150O (2024) https://doi.org/10.1117/12.3034610
KEYWORDS: Reticles, Scanners, Extreme ultraviolet lithography, Thermal deformation, Semiconducting wafers, Overlay metrology, Materials properties, Manufacturing, Image transmission, Tolerancing

Proceedings Article | 26 August 2024 Paper
Proceedings Volume 13177, 131770F (2024) https://doi.org/10.1117/12.3034393
KEYWORDS: Reflectivity, Optical proximity correction, Critical dimension metrology, Reflection, Light sources and illumination, Semiconducting wafers, Tantalum, Design, 3D mask effects, Scanners

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 129530J (2024) https://doi.org/10.1117/12.3010895
KEYWORDS: Critical dimension metrology, Reflectivity, Optical proximity correction, Light sources and illumination, Extreme ultraviolet, Design, Simulations, Scanners, Image processing, Modulation

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 1275002 (2023) https://doi.org/10.1117/12.2687703
KEYWORDS: Critical dimension metrology, Zoom lenses, Reticles, Metrology, Image quality, Extreme ultraviolet, Stochastic processes, Statistical analysis, Semiconducting wafers, Overlay metrology

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940Q (2023) https://doi.org/10.1117/12.2658511
KEYWORDS: Photomasks, Optical proximity correction, Reflection, Critical dimension metrology, Tantalum, Reflectivity, Metrology, Semiconducting wafers, Scanners, Reticles

Proceedings Article | 31 October 2022 Poster
Natalia Davydova, Vincent Wiaux, Joost Bekaert, Frank Timmermans, Bram Slachter, Tatiana Kovalevich, Eelco van Setten, Marcel Beckers, Simon van Gorp, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Hoon Ser, Diederik de Bruin, Stephen Hsu, Rene Carpaij
Proceedings Volume PC12292, PC1229210 (2022) https://doi.org/10.1117/12.2653388
KEYWORDS: Tantalum, Image resolution, Source mask optimization, Scanners, Reflectivity, Optical proximity correction, Manufacturing, Extreme ultraviolet lithography, Control systems

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC1205107 (2022) https://doi.org/10.1117/12.2614677
KEYWORDS: Extreme ultraviolet, Photomasks, Interfaces, Extreme ultraviolet lithography, Reticles, Multilayers, Visualization, Systems modeling, Resolution enhancement technologies, Prototyping

SPIE Journal Paper | 21 May 2021
Claire van Lare, Frank Timmermans, Jo Finders, Olena Romanets, Cheuk-Wah Man, Paul van Adrichem, Yohei Ikebe, Takeshi Aizawa, Takahiro Onoue
JM3, Vol. 20, Issue 02, 021006, (May 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.021006
KEYWORDS: Photomasks, Printing, Reflectivity, Extreme ultraviolet, Prototyping, Electroluminescence, Diffraction, Stochastic processes, Image enhancement, SRAF

Proceedings Article | 22 February 2021 Presentation
Claire van Lare, Frank Timmermans, Jo Finders, Olena Romanets, Cheuk-Wah Man, Paul van Adrichem, Yohei Ikebe, Takeshi Aizawa, Takahiro Onoue
Proceedings Volume 11609, 116090A (2021) https://doi.org/10.1117/12.2584725

Proceedings Article | 18 December 2020 Presentation + Paper
Proceedings Volume 11517, 115170Y (2020) https://doi.org/10.1117/12.2574450
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Reflectivity, EUV optics, Ion beams, Manufacturing

SPIE Journal Paper | 1 October 2020 Open Access
JM3, Vol. 19, Issue 04, 041001, (October 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.4.041001

Proceedings Article | 20 September 2020 Presentation
Proceedings Volume 11518, 1151807 (2020) https://doi.org/10.1117/12.2572355
KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Reticles, Scanners, Extreme ultraviolet lithography, EUV optics, Manufacturing, Physics, Deep ultraviolet

SPIE Journal Paper | 6 May 2020 Open Access
JM3, Vol. 19, Issue 02, 024401, (May 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.2.024401
KEYWORDS: Diffraction, Photomasks, Phase shifts, Picosecond phenomena, 3D modeling, Extreme ultraviolet, Refractive index, Scanners, Nanoimprint lithography, Tantalum

Proceedings Article | 24 March 2020 Presentation
Proceedings Volume 11323, 1132309 (2020) https://doi.org/10.1117/12.2550882
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithography, Imaging systems, Extreme ultraviolet, Refractive index, Nanoimprint lithography, Reflectivity, Tantalum, Lithographic illumination

Proceedings Article | 26 September 2019 Presentation + Paper
Proceedings Volume 11147, 111470D (2019) https://doi.org/10.1117/12.2536415
KEYWORDS: Photomasks, Extreme ultraviolet, Reticles, Nanoimprint lithography, Extreme ultraviolet lithography, Phase shifts, Scanners, Diffraction, Source mask optimization, EUV optics

Proceedings Article | 29 August 2019 Paper
Proceedings Volume 11177, 111770Y (2019) https://doi.org/10.1117/12.2535682
KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Diffraction, Scanners, Extreme ultraviolet lithography, Reticles

Proceedings Article | 1 May 2019 Presentation + Paper
Jo Finders, Robbert de Kruif, Frank Timmermans, Jara García Santaclara, Brid Connely, Markus Bender, Frank Schurack, Takahiro Onoue, Yohei Ikebe, Dave Farrar
Proceedings Volume 10957, 1095714 (2019) https://doi.org/10.1117/12.2515496
KEYWORDS: Photomasks, Absorption, Reticles, Extreme ultraviolet lithography, Tantalum, Diffraction, Etching, Refractive index, Scanners, Distortion

Proceedings Article | 19 September 2018 Paper
Proceedings Volume 10775, 107750U (2018) https://doi.org/10.1117/12.2326805
KEYWORDS: Photomasks, Phase shifts, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Computational lithography

Showing 5 of 19 publications
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