Dr. Edward Rutter Profile

Dr. Edward Rutter

at Littlefuse Inc

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Publications (3)

Proceedings Article | 18 March 2010 Paper

Characterization of line-edge roughness (LER) propagation from resists: underlayer interfaces in ultrathin resist films

Simi George, Patrick Naulleau, Ahila Krishnamoorthy, Zeyu Wu, Edward Rutter, Joseph Kennedy, Song Yuan Xie, Kyle Flanigan, Thomas Wallow

Proceedings Volume 7636, 763605 (2010) https://doi.org/10.1117/12.848405

KEYWORDS: Line edge roughness, Interfaces, Thin films, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, 3D image processing, Photoresist processing, Head-mounted displays, Liquids

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Proceedings Article | 4 April 2008 Paper

A high-Si content middle layer for ArF trilayer patterning

Joseph Kennedy, Songyuan Xie, Ronald Katsanes, Kyle Flanigan, Sudip Mukhopadhyay, Benjamin Wu, Edward Rutter, Mark Slezak

Proceedings Volume 6923, 69230W (2008) https://doi.org/10.1117/12.772854

KEYWORDS: Etching, Optical lithography, Plasma etching, Photoresist materials, Silicon, Plasma, Reflectivity, Chemistry, Photoresist processing, Wet etching

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Proceedings Article | 11 June 1999 Paper

High-resolution negative-tone chemically amplified i-line resists

Edward Rutter, Jonathan Root, Larry Bacchetti

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350264

KEYWORDS: Lithography, Critical dimension metrology, Polymers, Transparency, Standards development, Quenching (fluorescence), Etching, Resistance, Absorbance, Diffusion

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