Mark Slezak
Director: Lithography Technology at JSR Micro Inc
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 27 March 2014 Paper
Proceedings Volume 9051, 905118 (2014) https://doi.org/10.1117/12.2045617
KEYWORDS: Double patterning technology, Line width roughness, Optical lithography, Photoresist processing, Coating, Semiconducting wafers, Etching, Lithography, Photoresist materials, Plasma

Proceedings Article | 19 March 2012 Paper
Proceedings Volume 8325, 83251B (2012) https://doi.org/10.1117/12.916158
KEYWORDS: Polymers, Reflectivity, Silicon, Semiconducting wafers, Bottom antireflective coatings, Lithography, Chromophores, Critical dimension metrology, Silicon films, Solids

Proceedings Article | 16 April 2011 Paper
Steven Holmes, Cherry Tang, Sean Burns, Yunpeng Yin, Rex Chen, Chiew-seng Koay, Sumanth Kini, Hideyuki Tomizawa, Shyng-Tsong Chen, Nicolette Fender, Brian Osborn, Lovejeet Singh, Karen Petrillo, Guillaume Landie, Scott Halle, Sen Liu, John Arnold, Terry Spooner, Rao Varanasi, Mark Slezak, Matthew Colburn
Proceedings Volume 7972, 79720G (2011) https://doi.org/10.1117/12.881489
KEYWORDS: Photoresist processing, Reactive ion etching, Lithography, Photomasks, Dielectrics, Etching, Scanning electron microscopy, Double patterning technology, Semiconductors, Optical lithography

Proceedings Article | 16 April 2011 Paper
Joyce Lowes, Alice Guerrero, Michael Weigand, Carlton Washburn, Charlyn Stroud, Shalini Sharma, David Torres, Mark Slezak, Gary Dabbagh, Cherry Tang
Proceedings Volume 7972, 797227 (2011) https://doi.org/10.1117/12.879464
KEYWORDS: Picosecond phenomena, Photoresist materials, Lithography, Semiconducting wafers, Critical dimension metrology, Photoresist developing, Polymers, Silicon, Reflectivity, Photomasks

Proceedings Article | 30 March 2010 Paper
Stefan Harrer, John Arnold, Dario Goldfarb, Steven Holmes, Rex Chen, Cherry Tang, Mark Slezak, Nicolette Fender, Ronald Della Guardia, Eric Joseph, Sebastian Engelmann, Shyng-Tsong Chen, Dave Horak, Yunpeng Yin, Rao Varanasi, Matthew Colburn
Proceedings Volume 7639, 763919 (2010) https://doi.org/10.1117/12.846593
KEYWORDS: Back end of line, Dielectrics, Etching, Lithography, Reactive ion etching, Photoresist materials, Optical lithography, Semiconducting wafers, Copper, Polishing

Proceedings Article | 26 March 2010 Paper
Joyce Lowes, Victor Pham, Jim Meador, Charlyn Stroud, Ferdinand Rosas, Ramil-Marcelo Mercado, Mark Slezak
Proceedings Volume 7639, 76390K (2010) https://doi.org/10.1117/12.846608
KEYWORDS: Picosecond phenomena, Photoresist materials, Photoresist developing, Polymers, Lithography, Diffusion, Semiconducting wafers, Standards development, Chemistry, Quenching (fluorescence)

Proceedings Article | 26 March 2010 Paper
Proceedings Volume 7639, 76392X (2010) https://doi.org/10.1117/12.846891
KEYWORDS: Lithography, Photoresist processing, Semiconducting wafers, Double patterning technology, Semiconductors, Photomasks, Reactive ion etching, Silicon, Scanning electron microscopy, Particles

Proceedings Article | 26 March 2010 Paper
Proceedings Volume 7639, 76390I (2010) https://doi.org/10.1117/12.846443
KEYWORDS: Optical lithography, Einsteinium, Back end of line, Etching, Dielectrics, Semiconducting wafers, Lithography, Photoresist materials, Nanoimprint lithography, Reactive ion etching

Proceedings Article | 1 April 2009 Paper
Steven Holmes, Chiew-Seng Koay, Karen Petrillo, Kuang-Jung Chen, Matthew Colburn, Jason Cantone, Kenichi Ueda, Andrew Metz, Shannon Dunn, Youri van Dommelen, Michael Crouse, Judy Galloway, Emil Schmitt-Weaver, Aiquin Jiang, Robert Routh, Cherry Tang, Mark Slezak, Sumanth Kini, Tony DiBiase
Proceedings Volume 7273, 727305 (2009) https://doi.org/10.1117/12.828483
KEYWORDS: Overlay metrology, Semiconducting wafers, Double patterning technology, Lithography, Semiconductors, Defect inspection, Scanning electron microscopy, Logic, Polymers, Photomasks

Proceedings Article | 1 April 2009 Paper
Masahiko Harumoto, Sei Negoro, Akihiro Hisai, Michio Tanaka, Glen Mori, Mark Slezak
Proceedings Volume 7273, 72730P (2009) https://doi.org/10.1117/12.813605
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Raman spectroscopy, Carbon dioxide, Photoresist processing, Bridges, Image processing, Defect detection, Printing, Particles

Proceedings Article | 1 April 2009 Paper
Joseph Kennedy, Song-Yuan Xie, Ze-Yu Wu, Ron Katsanes, Kyle Flanigan, Kevin Lee, Mark Slezak, Zhi Liu, Shang-Ho Lin
Proceedings Volume 7273, 72733M (2009) https://doi.org/10.1117/12.814440
KEYWORDS: Photoresist materials, Etching, Optical lithography, Plasma etching, Lithography, Plasma, Silicon, Line width roughness, Scanning electron microscopy, Optical properties

Proceedings Article | 1 April 2009 Paper
Jim Meador, Joyce Lowes, Charlyn Stroud, Sherilyn Thomas, Yilin Qiu, Ramil-Marcelo Mercado, Victor Pham, Mark Slezak
Proceedings Volume 7273, 727312 (2009) https://doi.org/10.1117/12.813783
KEYWORDS: Lithography, Photoresist materials, Photoresist developing, Polymers, Scanning electron microscopy, Antireflective coatings, Interferometers, Polymer thin films, Electroluminescence, Bandpass filters

Proceedings Article | 1 April 2009 Paper
Karen Petrillo, Dave Horak, Susan Fan, Erin McLellan, Matt Colburn, Andrew Metz, Shannon Dunn, Dave Hetzer, Jason Cantone, Kenichi Ueda, Tom Winter, Vaidyanathan Balasubramaniam, Cherry Tang, Mark Slezak
Proceedings Volume 7273, 72731A (2009) https://doi.org/10.1117/12.814260
KEYWORDS: Reactive ion etching, Etching, Critical dimension metrology, Double patterning technology, Lithography, Ions, Semiconducting wafers, Cadmium, Scanners, Solar thermal energy

Proceedings Article | 4 December 2008 Paper
Joseph Kennedy, Song-Yuan Xie, Ze-Yu Wu, Ron Katsanes, Kyle Flanigan, Kevin Lee, Mark Slezak, Nicolette Fender, Junichi Takahashi
Proceedings Volume 7140, 71402S (2008) https://doi.org/10.1117/12.804699
KEYWORDS: Etching, Plasma etching, Photoresist materials, Optical lithography, Plasma, Silicon, Lithography, Optical properties, Polymers, Scanning electron microscopy

Proceedings Article | 23 April 2008 Paper
Taiichi Furukawa, Takanori Kishida, Kyouyuu Yasuda, Tsutomu Shimokawa, Zhi Liu, Mark Slezak, Katsuhiko Hieda
Proceedings Volume 6924, 692412 (2008) https://doi.org/10.1117/12.771122
KEYWORDS: Transmittance, Contamination, Absorbance, Microfluidics, Immersion lithography, Refractive index, Water, Laser irradiation, Ultraviolet radiation, Transparency

Proceedings Article | 4 April 2008 Paper
Proceedings Volume 6923, 69230W (2008) https://doi.org/10.1117/12.772854
KEYWORDS: Etching, Optical lithography, Plasma etching, Photoresist materials, Silicon, Plasma, Reflectivity, Chemistry, Photoresist processing, Wet etching

Proceedings Article | 26 March 2008 Paper
Shinya Minegishi, Nakaatsu Yoshimura, Mitsuo Sato, Yousuke Konno, Keiji Konno, Mark Slezak, Junichi Takahashi, Shigeru Abe, Yoshikazu Yamaguchi, Tsutomu Shimokawa
Proceedings Volume 6923, 69232X (2008) https://doi.org/10.1117/12.771621
KEYWORDS: Etching, Photomasks, Reflectivity, Resistance, Semiconducting wafers, Polymers, Silicon, Photoresist processing, Carbon, Lithography

Proceedings Article | 9 April 2007 Paper
Taiichi Furukawa, Takanori Kishida, Takashi Miyamatsu, Kazuo Kawaguchi, Kinji Yamada, Tetsuo Tominaga, Mark Slezak, Katsuhiko Hieda
Proceedings Volume 6519, 65190B (2007) https://doi.org/10.1117/12.711988
KEYWORDS: Refractive index, Absorbance, Immersion lithography, Water, Transparency, Transmittance, Optical properties, Ultraviolet radiation, Manufacturing, Laser irradiation

Proceedings Article | 9 April 2007 Paper
Proceedings Volume 6519, 651907 (2007) https://doi.org/10.1117/12.712095
KEYWORDS: Thin film coatings, Polymers, Polymer thin films, Lithography, Immersion lithography, Solids, Photoresist processing, Scanners, Scanning electron microscopy, Statistical analysis

Proceedings Article | 23 March 2007 Paper
Wenjie Li, Kuang-Jung Chen, Ranee Kwong, Margaret Lawson, Mahmoud Khojasteh, Irene Popova, P. Rao Varanasi, Tsutomu Shimokawa, Yoshikazu Yamaguchi, Shiro Kusumoto, Makoto Sugiura, Takanori Kawakami, Mark Slezak, Gary Dabbagh, Zhi Liu
Proceedings Volume 6519, 65190F (2007) https://doi.org/10.1117/12.712231
KEYWORDS: Polymers, Etching, Fluorine, Resistance, Lithography, Immersion lithography, 193nm lithography, Chemical species, Photoresist materials, Lithographic illumination

Proceedings Article | 4 May 2005 Paper
Pushkara Varanasi, Ranee Kwong, Mahmoud Khojasteh, Kaushal Patel, Kuang-Jung Chen, Wenjie Li, M. Lawson, Robert Allen, Ratnam Sooriyakumaran, P. Brock, Linda Sundberg, Mark Slezak, Gary Dabbagh, Z. Liu, Yukio Nishimura, Takashi Chiba, Tsutomu Shimokawa
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599700
KEYWORDS: Polymers, 193nm lithography, Lithography, Etching, Photoresist materials, Fluorine, Immersion lithography, Modulation, Photomasks, Reactive ion etching

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601621
KEYWORDS: Polymers, Lithography, Immersion lithography, Materials processing, Semiconducting wafers, Particles, Photoresist materials, Image processing, Photoresist processing, Scanners

Proceedings Article | 14 May 2004 Paper
Kaushal Patel, Margaret Lawson, Pushkara Rao Varanasi, David Medeiros, Gregory Wallraff, Phillip Brock, Richard DiPietro, Yukio Nishimura, Takashi Chiba, Mark Slezak
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536874
KEYWORDS: Polymers, Etching, Photoresist processing, Lithography, 193nm lithography, Printing, Oxides, Standards development, Resistance, Fluorine

Proceedings Article | 12 June 2003 Paper
Wenjie Li, Pushkara Varanasi, Margaret Lawson, Ranee Kwong, Kuang-Jung Chen, Hiroshi Ito, Hoa Truong, Robert Allen, Masafumi Yamamoto, Eiichi Kobayashi, Mark Slezak
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485100
KEYWORDS: Polymers, Etching, Lithography, Resistance, Fluorine, Surface roughness, Dry etching, Semiconducting wafers, 193nm lithography, Polymer thin films

Proceedings Article | 24 August 2001 Paper
Toru Kajita, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, A. Soyano, A. Kataoka, Mark Slezak, Makoto Shimizu, Pushkara Varanasi, G. Jordahamo, Margaret Lawson, R. Chen, William Brunsvold, Wenjie Li, Robert Allen, Hiroshi Ito, Hoa Truong, Thomas Wallow
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436833
KEYWORDS: Etching, Monochromatic aberrations, Chemistry, Polymers, Lithography, Polymerization, Resistance, Imaging systems, Surface roughness, Transparency

Proceedings Article | 24 August 2001 Paper
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436850
KEYWORDS: Photoresist materials, Optical lithography, 193nm lithography, Photoresist processing, Photomasks, Semiconducting wafers, Etching, Scanners, Lithography, Cadmium

Showing 5 of 26 publications
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