Dr. Jeff Chen Profile

Dr. Jeff Chen

Director at Applied Materials Inc

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Author

Publications (10)

Proceedings Article | 12 November 2024 Presentation + Paper

Etching approaches for next generation EUV photomask materials

Jeff Chen, Rebecca Stern, Rao Yalamanchili, Yohei Ikebe, Takahiro Onoue, Bryan Kasprowicz

Proceedings Volume 13216, 1321607 (2024) https://doi.org/10.1117/12.3035201

KEYWORDS: Etching, Extreme ultraviolet, Plasma etching, Atomic layer etching, Photomasks, Metals, Ions, Transmission electron microscopy, Thermodynamics

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Proceedings Article | 21 November 2023 Poster + Paper

Identifying new absorber materials for EUV photomasks

Rebecca Stern, Michael Grimbergen, Jeff Chen, Rao Yalamanchili

Proceedings Volume 12751, 1275118 (2023) https://doi.org/10.1117/12.2686935

KEYWORDS: Etching, Extreme ultraviolet, Chemistry, Photomasks, Alloys, Thermodynamics, Plasma, Chemical elements, Plasma etching, Refractive index

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Proceedings Article | 29 September 2023 Paper

Exploring photomask etching capabilities for new extreme ultraviolet absorber materials

Rebecca Stern, Jeff Chen, Rao Yalamanchili

Proceedings Volume 12915, 129150A (2023) https://doi.org/10.1117/12.2680780

KEYWORDS: Chemistry, Chemical elements, Etching, Extreme ultraviolet, Photomasks, Plasma, Refractive index, Thermodynamics

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Proceedings Article | 23 October 2015 Paper

Photomask etch system and process for 10nm technology node and beyond

Madhavi Chandrachood, Michael Grimbergen, Keven Yu, Toi Leung, Jeffrey Tran, Jeff Chen, Darin Bivens, Rao Yalamanchili, Richard Wistrom, Tom Faure, Peter Bartlau, Shaun Crawford, Yoshifumi Sakamoto

Proceedings Volume 9635, 963516 (2015) https://doi.org/10.1117/12.2199030

KEYWORDS: Etching, Photomasks, Opacity, Chromium, Critical dimension metrology, Process control, Phase shifts, Photoresist processing, Line edge roughness, Phase modulation

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Proceedings Article | 14 October 2011 Paper

Dry etching performance of advanced EUV mask blanks

John Whang, Madhavi Chandrachood, Emily Gallagher, Tom Faure, Michael Grimbergen, Shaun Crawford, Keven Yu, T. Y .B Leung, Richard Wistrom, Amitabh Sabharwal, Jeff Chen, Banqiu Wu

Proceedings Volume 8166, 81661W (2011) https://doi.org/10.1117/12.898815

KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Ruthenium, Line edge roughness, Multilayers, Binary data, Manufacturing, Extreme ultraviolet lithography, Tantalum

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Proceedings Article | 11 May 2009 Paper

Plasma optical emission analysis for chamber condition monitor

Zhigang Mao, Tiecheng Zhou, Michael Grimbergen, Darin Bivens, David Knick, Renee Koch, Madhavi Chandrachood, Jeff Chen, Ibrahim Ibrahim, Ajay Kumar

Proceedings Volume 7379, 73791U (2009) https://doi.org/10.1117/12.824306

KEYWORDS: Plasma, Etching, Oxygen, Chromium, Chlorine, Atmospheric plasma, Spectroscopy, Photomasks, Phase modulation, Contamination

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Proceedings Article | 11 May 2009 Paper

In situ selectivity monitor for dry etch of photomasks

Tiecheng Zhou, Jeff Chen, Michael Grimbergen, Madhavi Chandrachood, Ibrahim Ibrahim, Ajay Kumar

Proceedings Volume 7379, 73791T (2009) https://doi.org/10.1117/12.824305

KEYWORDS: Etching, Chromium, Photomasks, Dry etching, Photoresist processing, Algorithm development, Plasma, Refractive index, Quartz, Photoresist materials

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Proceedings Article | 19 May 2008 Paper

In-situ chamber clean for chromium etch application

Zhigang Mao, Xiaoyi Chen, David Knick, Michael Grimbergen, Madhavi Chandrahood, Ibrahim Ibrahim, Ajay Kumar

Proceedings Volume 7028, 702823 (2008) https://doi.org/10.1117/12.793080

KEYWORDS: Etching, Chromium, Chemistry, Plasma, Quartz, Photomasks, Photoresist materials, Particles, Critical dimension metrology, Plasma etching

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Proceedings Article | 19 May 2006 Paper

Photomask etch challenges for future technology nodes

Madhavi Chandrachood, Michael Grimbergen, Toi Yue Leung, Keven Yu, Renee Koch, Jeff Chen, Ibrahim Ibrahim, Sheeba Panayil, Ajay Kumar

Proceedings Volume 6283, 62830C (2006) https://doi.org/10.1117/12.684417

KEYWORDS: Etching, Photomasks, Chromium, Critical dimension metrology, Reactive ion etching, Resolution enhancement technologies, Quartz, Control systems, Plasma etching, Phase shifts

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Proceedings Article | 4 November 2005 Paper

65 nm node photomask etching with zero CD process bias

Banqiu Wu, Jeff Chen, Ed Markovitz, Guangming Xiao, Simon Tam, Ajay Kumar, Ibrahim Ibrahim, Wai-Fan Yau

Proceedings Volume 5992, 59920P (2005) https://doi.org/10.1117/12.632228

KEYWORDS: Etching, Chromium, Photomasks, Plasma etching, Plasma, Raw materials, Cadmium, Photoresist materials, Oxygen, Quartz

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Showing 5 of 10 publications

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