Dr. Jong Keun Park Profile

Dr. Jong Keun Park

at DuPont Electronics & Industrial

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Author

Publications (21)

Proceedings Article | 10 April 2024 Presentation + Paper

Advanced EUV CAR small molecule compounds design and its impact to etch performance

Yinjie Cen, Jong Keun Park, Suzanne Coley, Benjamin Naab-Rafael, Li Cui, Emad Aqad, Stefan Alexandrescu, Rochelle Rena, Sylvie Eckert, Jason Behnke, ChoongBong Lee, Karen Petrillo

Proceedings Volume 12957, 129570A (2024) https://doi.org/10.1117/12.3010931

KEYWORDS: Etching, Photoresist materials, Extreme ultraviolet lithography

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Proceedings Article | 10 April 2024 Poster

Formulation and filtration strategies to reduce etch related defectivity of advanced chemically amplified EUV resist

Suzanne Coley, Jong Keun Park, Emad Aqad, Yinjie Cen, Li Cui, Conner Hoelzel, Benjamin Naab, Maria Melanson, Hung Tran, Stefan Alexandrescu, Rochelle Rena, Jason Behnke, Karen Petrillo

Proceedings Volume 12957, 129571Y (2024) https://doi.org/10.1117/12.3010919

KEYWORDS: Extreme ultraviolet, Stochastic processes, Etching, Photoresist processing, Photons, Manufacturing, Lithography, Design and modelling, Optical lithography, Materials processing

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Proceedings Article | 9 April 2024 Paper

Impact of increasing EUV absorption of CAR polymers on lithographic performance

Yinjie Cen, Emad Aqad, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Rochelle Rena, Tyler Paul, Sylvie Eckert, Chunyi Wu, Mike Finch, Jason Behnke, ChoongBong Lee, Karen Petrillo

Proceedings Volume 12957, 129571Z (2024) https://doi.org/10.1117/12.3010961

KEYWORDS: Polymers, Extreme ultraviolet, Absorption, Extreme ultraviolet lithography, Photoresist materials, Line width roughness, Lithography

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Proceedings Article | 9 April 2024 Presentation + Paper

Acid generation efficiency prediction by bond cleavage calculation of EUV photoacid generators

Jayoung Koo, YunJi Kim, You Rim Shin, HyunHo Yoon, Philjae Kang, Ye Ri Han, Jong Keun Park, Karen Petrillo, Jae Hwan Sim

Proceedings Volume 12957, 129571C (2024) https://doi.org/10.1117/12.3010977

KEYWORDS: Photoacid generators, Electrons, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Photoresist materials, Mathematical optimization, Light absorption, Materials properties, Chemical species

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Proceedings Article | 9 April 2024 Poster + Paper

Identifying trends in photoresist polymer properties to improve line and space defects

Benjamin Rafael-Naab, Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Choong Bong Lee, Jason Behnke, Rochelle Rena, Sylvie Eckert, Stefan Alexandrescu, K. A. Niradha Sachinthani, Michael Finch, Karen Petrillo, Li Cheng

Proceedings Volume 12957, 129571S (2024) https://doi.org/10.1117/12.3010493

KEYWORDS: Defect inspection, Photoresist materials, Polymers, Line width roughness, Extreme ultraviolet lithography, Photoacid generators, Semiconducting wafers

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Proceedings Article | 9 April 2024 Paper

Disruptive non-fluorinated photoacid generators using computational chemistry and library design

P. LaBeaume, K. Hernandez, E. Vitaku, T. Marangoni, E. Aqad, M. Li, C. Hoelzel, J. Lachowski, M. Hayes, S. Wong, J. Li, A. Kwok, W. Huang, J. Park, H. He, H. Mackay, C. Liu, J. Cameron, C. Xu, Q. Xie, K. Petrillo

Proceedings Volume 12957, 129572B (2024) https://doi.org/10.1117/12.3025297

KEYWORDS: Photoacid generators, Photoresist materials, Semiconducting wafers, Design, Lithography, Optical lithography, Coating thickness, Chemistry, Coating, Silicon, Sustainability, Extreme ultraviolet lithography

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Proceedings Article | 1 May 2023 Presentation + Paper

Understanding etch properties of advanced chemically amplified EUV resist

Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Benjamin Naab, Choongbong Lee, Rochelle Rena, Philjae Kang, You Rim Shin, David Limberg, Lei Zhang

Proceedings Volume 12499, 124990I (2023) https://doi.org/10.1117/12.2659178

KEYWORDS: Etching, Iodine, Extreme ultraviolet, Plasma, Plasma etching, X-ray photoelectron spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Light absorption, Absorption

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Proceedings Article | 1 May 2023 Poster + Paper

Spin speed impact on photoresist thin film properties and EUV lithographic performance

Yinjie Cen, ChoongBong Lee, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Emad Aqad, Rochelle Rena, Tyler Paul, Tom Penniman, Jason Behnke, Julia Early, Benjamin Foltz

Proceedings Volume 12498, 124981W (2023) https://doi.org/10.1117/12.2659101

KEYWORDS: Photoresist materials, Film thickness, Lithography, Extreme ultraviolet lithography, Line width roughness, Thin films, Surface roughness

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Proceedings Article | 1 May 2023 Poster + Paper

Considerations in the design of photoacid generators

Conner Hoelzel, Li Cui, Benjamin Naab, Jong Park, Philjae Kang, Kenneth Hernandez, Suzanne Coley, Stefan Alexandrescu, Rochelle Rena, James Cameron, Emad Aqad

Proceedings Volume 12498, 124981V (2023) https://doi.org/10.1117/12.2658981

KEYWORDS: Photoacid generators, Extreme ultraviolet lithography, Electrons, Extreme ultraviolet, Polymers, Design and modelling, Lithography, Materials properties, Line width roughness, Semiconducting wafers

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Proceedings Article | 14 March 2023 Presentation + Paper

905nm 140W pulse laser diode with 4Stack epitaxy structure for autonomous Lidar

Ansik Choi, Jongkeun Park, Jaebong Lee, Younghwan Kim, Taekyung Kim

Proceedings Volume 12403, 1240307 (2023) https://doi.org/10.1117/12.2648117

KEYWORDS: Semiconductor lasers, LIDAR, Gallium arsenide, Epitaxy, Aluminum, Quantum tunneling, Quantum wells, Fabrication, Silicon, Laser development

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Proceedings Article | 23 March 2020 Presentation + Paper

Challenges and opportunities of KrF photoresist development for 3D NAND application

Yang Song, Mingqi Li, Jong Park, Xisen Hou, Yusuke Matsuda, Cong Liu, Emad Aqad, Janet Wu, Huan He, Huiying Liu, Paul Baranowski, Cheng Bai Xu

Proceedings Volume 11326, 113260N (2020) https://doi.org/10.1117/12.2552140

KEYWORDS: Photoresist materials, Polymers, Absorbance, Coating, Photoresist developing, 3D applications, Transparency, Transmittance, Molecules, Lithography

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Proceedings Article | 24 February 2020 Presentation + Paper

940nm 400mW transverse single mode laser diode with RISA structure

Jeong-Geun Kwak, Jong-Keun Park, Jeong-Hyun Park, Jae-Gyu Kim, An-Sik Choi, Tae-Kyung Kim, Duchang Heo

Proceedings Volume 11301, 113010Z (2020) https://doi.org/10.1117/12.2545268

KEYWORDS: Gallium arsenide, Semiconductor lasers, Aluminum, Reliability, Silicon, Resistance, Sensors, Waveguides, Etching, Oxides

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Proceedings Article | 25 March 2019 Paper

Contact hole shrink of 193nm NTD immersion resist

Joshua Kaitz, Janet Wu, Vipul Jain, Iou-Sheng Ke, Mingqi Li, Amy Kwok, James Park, Jong Park, Jin Wuk Sung, Cong Liu

Proceedings Volume 10960, 1096022 (2019) https://doi.org/10.1117/12.2518366

KEYWORDS: Polymers, Chemistry, Optical lithography, Lithography, Semiconducting wafers, Scanning electron microscopy, Electronics, Extreme ultraviolet lithography

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Proceedings Article | 4 March 2019 Presentation + Paper

940nm high-power laser diode based on AlGaAs/InGaAs GRIN-SCH and asymmetric structure

Jeong-Geun Kwak, Seung-Hyun Sung, Jong-Keun Park, Jeong-Hyun Park, An-Sik Choi, Tae-Kyung Kim

Proceedings Volume 10900, 109000L (2019) https://doi.org/10.1117/12.2507364

KEYWORDS: Doping, Reliability, High power lasers, Diodes, Semiconductor lasers, Near field optics, Resistance, Sensors, Waveguides, Silicon

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Proceedings Article | 13 March 2018 Paper

Chemical trimming overcoat: an advanced composition and process for photoresist enhancement in lithography

Xisen Hou, Cong Liu, Kevin Rowell, Irvinder Kaur, Mingqi Li, Paul Baranowski, Jong Park, Cheng Bai Xu

Proceedings Volume 10586, 105861I (2018) https://doi.org/10.1117/12.2307674

KEYWORDS: Photoresist materials, Line width roughness, Critical dimension metrology, Lithography, Photoresist developing, Optical lithography, Extreme ultraviolet lithography, Coating, Defect inspection, Photoresist processing, Photoresist technology

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Proceedings Article | 25 May 2017 Presentation

Advanced hole patterning technology using soft spacer materials (Conference Presentation)

Jong Keun Park, Phillip Hustad, Emad Aqad, David Valeri, Mike Wagner, Mingqi Li

Proceedings Volume 10146, 101461C (2017) https://doi.org/10.1117/12.2258667

KEYWORDS: Lithium, Optical lithography, Double patterning technology, Manufacturing, Integrated circuits, Photomasks, Immersion lithography, Deposition processes, Etching, Coating

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Proceedings Article | 26 March 2013 Paper

New materials and processes for directed self-assembly

Shih-wei Chang, Jessica Evans, Shouren Ge, Valeriy Ginzburg, John Kramer, Brian Landes, Christopher Lee, Greg Meyers, Daniel Murray, Jong Park, Rahul Sharma, Peter Trefonas, Jeffrey Weinhold, Jieqian Zhang, Phillip Hustad

Proceedings Volume 8680, 86800F (2013) https://doi.org/10.1117/12.2011604

KEYWORDS: Diffusion, Annealing, Optical lithography, Thin film coatings, Thin films, Polymers, Reactive ion etching, Scanning electron microscopy, Materials processing, Directed self assembly

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Proceedings Article | 20 March 2012 Paper

Evolution of negative tone development photoresists for ArF lithography

Michael Reilly, Cecily Andes, Thomas Cardolaccia, Young Seok Kim, Jong Keun Park

Proceedings Volume 8325, 832507 (2012) https://doi.org/10.1117/12.916633

KEYWORDS: Photoresist developing, Photoresist materials, Chemistry, Lithography, Photomasks, Line width roughness, Polymers, Printing, Semiconducting wafers, Critical dimension metrology

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Proceedings Article | 19 March 2012 Paper

Understanding dissolution behavior of 193nm photoresists in organic solvent developers

Seung-Hyun Lee, Jong Keun Park, Thomas Cardolaccia, Jibin Sun, Cecily Andes, Kathleen O'Connell, George Barclay

Proceedings Volume 8325, 83250Q (2012) https://doi.org/10.1117/12.918045

KEYWORDS: Polymers, Photoresist developing, Photoresist materials, Lithography, Semiconducting wafers, Molecules, Photoresist processing, Molecular interactions, Polymer thin films, Radium

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Proceedings Article | 22 February 2011 Paper

A study on 8 beam laser diode to adopt laser scanning unit

Dae-Gwon Song, Jong-Keun Park, Jung-Hyun Park, An-Sik Choi, Tae-Kyung Kim

Proceedings Volume 7920, 79200X (2011) https://doi.org/10.1117/12.874273

KEYWORDS: Semiconductor lasers, Printing, Laser scanners, Laser development, Nonimpact printing, Bridges, Reliability, Laser optics, Etching, Scanning probe lithography

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Proceedings Article | 6 April 2009 Paper

Electromechanical performance and membrane stability of novel ionic polymer transducers constructed in the presence of ionic liquids

Andrew Duncan, Donald Leo, Timothy Long, Barbar Akle, Jong Park, Robert Moore

Proceedings Volume 7287, 728711 (2009) https://doi.org/10.1117/12.815874

KEYWORDS: Liquids, Polymers, Scattering, Electroactive polymers, Transducers, X-rays, Laser scattering, Glasses, Resistance, Actuators

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Ionic polymer transducers (IPT) are a class of devices that leverage electroactive polymers (EAP), specifically electrolyte-swollen ionomeric membranes, to perform energy conversions. Energy transformation from input to output is referred to as transduction and occurs between the electrical and mechanical domains. The present study expands on IPT investigations with a novel series of sulfonated polysulfones (sBPS), with specific interest in the effect of polymer topology on actuator performance. A hydrophilic ionic liquid was combined with a series of sBPS through a casting method to create hydrated membranes that contained target uptakes (f) of the diluent. The ionic liquid's hydrophilic, yet organic nature raised the issue of its degree of compatibility and miscibility with the microphase separated domains of the host ionomeric membrane. Initial studies of the ionomer - ionic liquid morphology were performed with synchrotron small angle X-ray scattering (SAXS). The effective plasticization of the membranes was identified with dynamic mechanical analysis (DMA) in terms of varied storage modulus and thermal transitions with ionic liquid uptake. Electrical impedance spectroscopy (EIS) was employed to quantify the changes in ionic conductivity for each sBPS ionomer across a range of uptake. Combined results from these techniques implied that the presence of large amounts of ionic liquid swelled the hydrophilic domains of the ionomer and greatly increased the ionic conductivity. Decreases in storage modulus and the glass transition temperature were proportional to one another but of a lesser magnitude than changes in conductivity. The present range of ionic liquid uptake for sBPS was sufficient to identify the critical uptake (f_c) for three of the four ionomers in the series. Future work to construct IPTs with these components will use the critical uptake as a minimum allowable content of ionic liquid to optimize the balance of electrical and mechanical properties for the device components.

Showing 5 of 21 publications

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