Dr. Norio Nakamura
at High Energy Accelerator Research Organization KEK
SPIE Involvement:
Author
Area of Expertise:
Accelerator , Synchrotron radiation source , Free-electron laser , Energy recovery linac , Beam dynamics , Light source
Profile Summary

Norio Nakamura is a professor emeritus and researcher in accelerator-based light sources at High Energy Accelerator Research Organization (KEK), where he was a professor and leader of the beam dynamics and magnet group in Accelerator Division VI (Light Source Division) of the Accelerator Laboratory from April 2011 to March 2023. His main research subject is advanced light sources such as high-power free-electron lasers (FELs) based on energy-recovery linac (ERL) and next-generation synchrotron radiation sources. He received his Ph. D in Physics from the University of Tokyo in 1987. He first worked as a research associate for the Photon Factory at KEK from 1987 to 1996 and then worked as an associate professor in the Synchrotron Radiation Laboratory of the Institute for Solid State Physics (ISSP) at the University of Tokyo from 1996 to 2011.
Publications (7)

Proceedings Article | 26 August 2024 Paper
Norio Nakamura, Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yoshinori Tanimoto, Yosuke Honda, Miho Shimada, Masahiro Yamamoto, Takanori Tanikawa, Olga Tanaka, Takashi Obina, Shinichiro Michizono, Hiroshi Kawata
Proceedings Volume 13177, 131770L (2024) https://doi.org/10.1117/12.3033966
KEYWORDS: Free electron lasers, Light sources, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Power consumption, Polarization, Polarization control, Scanners, Tin

SPIE Journal Paper | 25 June 2022 Open Access
JM3, Vol. 21, Issue 02, 021210, (June 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.021210
KEYWORDS: Free electron lasers, Light sources, Extreme ultraviolet lithography, Extreme ultraviolet, Electron beams, Mirrors, Scanners, Tin, Magnetism, Niobium

Proceedings Article | 13 June 2022 Poster + Presentation
Proceedings Volume PC12051, PC120510S (2022) https://doi.org/10.1117/12.2613617
KEYWORDS: Lithography, Free electron lasers, Extreme ultraviolet, Stochastic processes, Physics, Optical resonators, Machine learning, Light sources, Laser development, Infrared radiation

Proceedings Article | 30 September 2021 Presentation
Proceedings Volume 11854, 118540M (2021) https://doi.org/10.1117/12.2600782
KEYWORDS: Free electron lasers, Lithography, Light sources, Extreme ultraviolet, Optical simulations, Laser development, Extreme ultraviolet lithography, Continuous wave operation, Stochastic processes, Scanners

Proceedings Article | 20 September 2020 Presentation
Proceedings Volume 11517, 115170R (2020) https://doi.org/10.1117/12.2573121
KEYWORDS: Light sources, Free electron lasers, Extreme ultraviolet lithography, Mid-IR, Photomask technology, Extreme ultraviolet, Stochastic processes, Electron beams, Mirrors, Magnetism

Showing 5 of 7 publications
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