CONFERENCE PROCEEDINGS
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Baikkyu Hong
at SK Hynix Inc
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Author
Publications (4)
Proceedings Article | 10 April 2024 Poster + Paper
Single-cell measurements by parallax effect for process control and target size reduction
Changkyu Lee, Sumin Jang, Baikkyu Hong, Ikhyun Jeong, Sunouk Nam, Hyunsok Kim, Jaewuk Ju, Minho Jung, Mingyu Kim, Hongpeng Su, Yanan Wang, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Roie Volkovich, Nadav Gutman, Ohad Bachar, Renan Milo
Proceedings Volume 12955, 129552H (2024) https://doi.org/10.1117/12.3010101
KEYWORDS: Overlay metrology, Semiconducting wafers, Wafer level optics, Metrology, Optical gratings, Process control, Optical parametric oscillators, Time metrology, Optical alignment
Proceedings Article | 27 April 2023 Poster + Paper
ADI to in-cell overlay stability improvement for DRAM using novel scatterometry and comprehensive process control
Proceedings Volume 12496, 124962E (2023) https://doi.org/10.1117/12.2657632
KEYWORDS: Overlay metrology, Semiconducting wafers, Advanced process control, Scanners, Scatterometry, Process control, Signal processing, Metrology, Control systems, Optical parametric oscillators
Proceedings Article | 27 April 2023 Poster + Paper
Effective tool induced shift (eTIS) for determining the total measurement uncertainty (TMU) in overlay metrology
Proceedings Volume 12496, 124963O (2023) https://doi.org/10.1117/12.2670420
KEYWORDS: Semiconducting wafers, Metrology, Calibration, Overlay metrology, Measurement uncertainty, Optical parametric oscillators, Advanced process control, Time metrology, Reproducibility, Optical lithography
Proceedings Article | 27 April 2023 Presentation + Paper
Enhancement of overlay metrology accuracy by multi-wavelength scatterometry with rotated quadrupole illumination
Hyunsok Kim, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Sumin Jang, Kangmin Lee, Hongpeng Su, Minho Jeong, Mingyu Kim, Hongcheon Yang, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Rawi Dirawi
Proceedings Volume 12496, 1249620 (2023) https://doi.org/10.1117/12.2657678
KEYWORDS: Overlay metrology, Light sources and illumination, Metrology, Signal detection, Scatterometry, Diffraction, Semiconducting wafers, Etching, Tunable lasers, Signal processing
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